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Sputtering Technology
An Overview of Magnetron Sputtering Magnetron sputtering, a physical vapor deposition (PVD) process, is the main thin film deposition method for manufacturing semiconductor, disk drive, CD and optical devices. Magnetron sputtering has evolved since the 1970s, which has the advantages of high speed, low temperature and low damage. Definition Sputter deposition is the process whereby...
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PVD High Vacuum Coating Machines
The structure of high vacuum coating machine Vacuum body – vacuum chamber According to the different requirements of the processed products, the size of the vacuum chamber is different. The most widely used chamber diameters are 1.3m, 0.9m, 1.5m, 1.8m, etc. The chamber cavity is made of stainless steel, which is hard and rustless. Each...
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sputtering-target-purity
Effect of Sputtering Target Purity on Large-Area Coating Production The requirement of the target quality for sputter coating is higher than that of the traditional materials industry. When the substrate enters the high vacuum coating chamber, if the sputtering target is not pure enough, under the action of the electric field and the magnetic field,...
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dual-co-rf-magnetron-sputtering4
Scandium nitride (ScN) is a metal nitride semiconductor. The crystal structure of ScN is generally rock salt and non-polar. However, the first principle calculation indicates that ScN may also have wurtzite structure and can be made into Sc-IIIA-Nitride. The IIIA nitride refers to AlN, GaN and InN, and the structure of the nitride is a...
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titanium-dioxide
Titanium dioxide is a hard and chemically resistant oxide of titanium. TiO2 thin films have been widely used in various applications due to their multiple interesting properties. It has a high refractive index, which makes it attractive for the glass coating industry to produce low emissivity and antireflective coatings. It is interesting in microelectronics because...
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Everything about ito sputtering target
Definition The full name of ITO is indium tin oxide, a composition of indium, tin, and oxygen with different proportions. The substance of ITO and ITO sputtering target is the same, the latter of which is actually a black-gray ceramic semiconductor formed by mixing indium oxide and tin oxide powder in a certain ratio. How...
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different target shapes
Almost all new sputter deposition equipment uses a powerful magnet to spiral the electrons to accelerate the ionization of the argon around the target, resulting in an increased probability of collision between the sputtering target and the argon ions, and thus the sputtering rate is increased. Generally, most metal films uses DC sputtering, while non-conductive...
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cold pressing
Previously, we have introduced Four main molding methods for ITO targets, mainly about their definitions and characteristics. And today I think it necessary to talk about the advantages and disadvantages of each method, which is helpful for you to make choices between them when you want to prepare ITO targets. Hot Pressing The hot pressing...
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Zn powder
How to use ZnO or Zn powder to make large diameter sputtering target? If you want to make a sputtering target by using ZnO or Zn powder, you have to know the following points. How to make a sputtering target? There are two main ways to make a sputtering target. One is casting. The alloy...
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