Chemical Formula: LiNbO3
Catalog Number: ST0172
CAS Number: 12031-63-9
Purity: >99.9%
Shape: Discs, Plates, Columns, Step Targets, Custom
Stanford Advanced Materials (SAM) supplies high-purity lithium niobate (LiNbO₃) sputtering targets for RF sputtering and PVD coating applications. Known for its ferroelectric, piezoelectric, and nonlinear optical properties, lithium niobate is a key material in thin film deposition for photonics, telecom, and semiconductor industries.
LiNbO₃ targets are offered in multiple sizes and purities, with copper bondind or other options to fit your sputtering system requirements.
Related Product: Lithium Sputtering Target, Oxide Ceramic Sputtering Target
High Purity Lithium Niobate for Advanced Thin Film Applications
Material | Lithium Niobate (LiNbO₃) |
Color | White crystalline solid |
Purity | >99.9% |
Density | 4.638 g/cm³ |
Sputter Type | RF, RF-R |
Available Diameters | 1.0″ to 6.0″ |
Available Thickness | 0.125″, 0.250″ |
Bonding Options | Indium Bonding, Elastomer Bonding |
Notes | Custom shapes/sizes available |
Lithium niobate sputtering targets are used for RF magnetron sputtering in a wide range of advanced technologies:
Telecommunications
Thin film deposition for optical waveguides, optical modulators, and mobile device components.
Photonic & Optoelectronic Devices
Integrated optics, nonlinear optical components, and frequency doubling (SHG) devices.
Semiconductors & MEMS
Ferroelectric and piezoelectric thin films in microelectromechanical systems (MEMS).
Lasers & Q-Switches
Pockels cells, Q-switches, optical parametric oscillators, and modulators.
Advanced Coatings
Transparent, high-dielectric coatings for displays, LEDs, and precision optics.
All lithium niobate sputtering targets are individually vacuum-sealed, shock-protected, and clearly labeled. Each shipment includes full documentation and undergoes rigorous quality checks for dimension, density, and purity.
High Quality lithium niobate sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.
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Love the look and the way they are packed.