ST0217 Titanium Nitride Sputtering Target, TiN

Titanium Nitride Sputtering Target Description

Titanium nitride sputtering target from Stanford Advanced Materials is a ceramic sputtering material containing Ti and N. Titanium nitride is an extremely hard ceramic material, often used as a coating on titanium alloys, steel, carbide, and aluminum components to improve the substrate’s surface properties.

Titanium is a chemical element originated from Titans, the sons of the Earth goddess of Greek mythology. It was first mentioned in 1791 and observed by W. Gregor. The isolation was later accomplished and announced by J. Berzelius. “Ti” is the canonical chemical symbol of titanium. Its atomic number in the periodic table of elements is 22 with a location at Period 4 and Group 4, belonging to the d-block. The relative atomic mass of titanium is 47.867(1) Dalton, the number in the brackets indicating the uncertainty.

Nitrogen is a chemical element that originated from the Greek ‘nitron’ and ‘genes’ meaning nitre-forming. It was first mentioned in 1772 and observed by D. Rutherford. The isolation was later accomplished and announced by D. Rutherford. “N” is the canonical chemical symbol of nitrogen. Its atomic number in the periodic table of elements is 7 with a location at Period 2 and Group 15, belonging to the p-block. The relative atomic mass of nitrogen is 14.0067(2) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Titanium Sputtering Target, Nitride Ceramic Sputtering Target

Titanium Nitride Sputtering Target Specification

We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.

Titanium Nitride Sputtering Target Application

• Titanium nitride sputtering targets are used to make TiN films. The tiN coating can be used on machine tools (such as drills and milling cutters) to maintain the edges and have corrosion resistance, usually increasing its service life by more than three times.
• Because of TiN’s metallic gold color, it is used to coat costume jewelry and automotive trim for decorative purposes.
• Thin films of TiN are also used in microelectronics , where they serve as a conductive connection between the active device and the metal contacts used to operate the circuit, while acting as a diffusion barrier to block the diffusion of the metal into the silicon.
• TiN films can also be used as electrodes in bioelectronic applications, such as smart implants or in vivo biosensors that must withstand severe corrosion caused by body fluids.

Titanium Nitride Sputtering Target Packing

Our titanium nitride sputter coater targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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High-quality titanium nitride sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes. Please send us an inquiry for the current prices on the sputtering targets and other deposition materials that are not listed.