(949) 407-8904 Mon - Fri 08:00 - 17:00 1940 East Deere Avenue, Suite 100, Santa Ana, CA 92705, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 1940 East Deere Avenue, Suite 100, Santa Ana, CA 92705, USA

ST0217 Titanium Nitride Sputtering Target, TiN

Chemical Formula: TiN
Catalog Number: ST0217
CAS Number: 25583-20-4
Purity: 99.5%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Stanford Advanced Materials (SAM) offers high-quality Titanium Nitride sputtering targets for thin film deposition applications. With superior hardness, wear resistance, and thermal stability, our TiN sputtering targets meet the demands of diverse industries, including microelectronics, coatings, and decorative applications.

Titanium Nitride MSDS File




Description

High-Purity Titanium Nitride for Advanced Thin Film Applications

Titanium Nitride Sputtering Target Description

The Titanium Nitride (TiN) sputtering target is a ceramic material composed of titanium (Ti) and nitrogen (N), widely recognized for its exceptional performance in thin film deposition processes.

TitaniumNitrogen

Titanium nitride sputtering targets are commonly used to produce hard coatings on tools, decorative layers, and conductive films in microelectronics. It is particularly valued for its:

  • High durability and corrosion resistance.
  • Superior uniformity and adhesion in coatings.
  • Adaptability to different substrates, such as silicon wafers, titanium alloys, and steel.

Why Choose SAM’s TiN Sputtering Targets?

  • Optimized for thin film applications, ensuring excellent film growth and microstructural control.
  • Customizable sizes and shapes to suit research and industrial production needs.
  • Backed by a global network for reliable quality and delivery.

Titanium Nitride Sputtering Target Specification

Material Type Titanium Nitride
Symbol TiN
Color/Appearance Yellow-Brown, Crystalline Solid
Melting Point 2,930° C
Density 5.4 g/cm3
Available Sizes Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

We also offer other customized shapes and sizes of the sputtering targets. Please send us an inquiry for more information.

Titanium Nitride Sputtering Target Ordering Options

Material Size Purity
Titanium Nitride Sputtering Target 1.00″ Dia. x 0.125″ Thick 99.5%
Titanium Nitride Sputtering Target 1.00″ Dia. x 0.250″ Thick 99.5%
Titanium Nitride Sputtering Target 2.00″ Dia. x 0.125″ Thick 99.5%
Titanium Nitride Sputtering Target 2.00″ Dia. x 0.250″ Thick 99.5%
Titanium Nitride Sputtering Target 3.00″ Dia. x 0.125″ Thick 99.5%
Titanium Nitride Sputtering Target 3.00″ Dia. x 0.250″ Thick 99.5%
Titanium Nitride Sputtering Target 4.00″ Dia. x 0.125″ Thick 99.5%
Titanium Nitride Sputtering Target 4.00″ Dia. x 0.250″ Thick 99.5%
Titanium Nitride Sputtering Target 57mm Dia. x 3mm Thick 99.5%

Titanium Nitride Sputtering Target Application

Industrial Coatings

TiN coatings enhance tool performance, providing increased wear resistance and corrosion protection. This is particularly beneficial for:

  • Drills, milling cutters, and machining tools, extending their lifespan by 3x or more.

Microelectronics

TiN thin films are widely used in semiconductor devices as:

  • Conductive barriers and diffusion layers to prevent metal migration.

Contact materials for circuits and connectors, ensuring stability and conductivity.

Decorative Coatings

With its metallic gold color, TiN is ideal for:

  • Costume jewelry and automotive trims, offering both durability and aesthetics.

Bioelectronics

TiN films serve as electrodes in biosensors and implants, offering excellent corrosion resistance and biocompatibility.

Advanced Research

TiN is also used in space technology and materials research, including applications where extreme conditions demand high-performance materials.

Titanium Nitride Bonded Assemblies Ordering Options

Indium bonding and elastomeric target bonding services are available for Titanium Nitride sputtering targets. Stanford Advanced Materials is dedicated to the precision machining of standard backing plates and collaborates closely with Taiwan Bonding Company to deliver high-quality bonding solutions.

Material Target Size Purity Bonding Type Backing Plate Size
Titanium Nitride Sputtering Target 2.00″ Dia x 0.125″ Thick 99.5% Indium 2.00″ Dia x 0.125″ Thick
Titanium Nitride Sputtering Target 2.00″ Dia x 0.125″ Thick 99.5% Elastomer 2.00″ Dia x 0.125″ Thick
Titanium Nitride Sputtering Target 2.00″ Dia x 0.125″ Thick 99.5% Indium 2.00″ Dia x 0.092″ Thick
Titanium Nitride Sputtering Target 2.00″ Dia x 0.125″ Thick 99.5% Elastomer 2.00″ Dia x 0.125″ Thick
Titanium Nitride Sputtering Target 3.00″ Dia x 0.125″ Thick 99.5% Indium 3.00″ Dia x 0.125″ Thick
Titanium Nitride Sputtering Target 3.00″ Dia x 0.125″ Thick 99.5% Elastomer 3.00″ Dia x 0.092″ Thick
Titanium Nitride Sputtering Target 3.00″ Dia x 0.125″ Thick 99.5% Elastomer 3.00″ Dia x 0.125″ Thick
Titanium Nitride Sputtering Target 3.00″ Dia x 0.125″ Thick 99.5% Indium 3.00″ Dia x 0.092″ Thick
Titanium Nitride Sputtering Target 3.00″ Dia x 0.125″ Thick 99.5% Elastomer 3.00″ Dia x 0.125″ Thick
Titanium Nitride Sputtering Target 4.00″ Dia x 0.125″ Thick 99.5% Indium 4.00″ Dia x 0.125″ Thick
Titanium Nitride Sputtering Target 4.00″ Dia x 0.125″ Thick 99.5% Elastomer 4.00″ Dia x 0.125″ Thick

Titanium Nitride Sputtering Target Packing

Our titanium nitride sputter coater targets are tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Get Contact

At Stanford Advanced Materials (SAM), we specialize in producing high-quality sputtering targets with:

  • High purity, ensuring the smallest grain sizes for optimal film deposition.
  • A global network for reliable delivery and support.

Contact us today to request a quote or discuss custom solutions for your project. Our team is ready to assist with any inquiries.

FAQs for Titanium Nitride Sputtering Targets

Q1: What are the typical applications of Titanium Nitride sputtering targets?
A: Titanium Nitride (TiN) sputtering targets are widely used for thin film coatings that provide excellent wear resistance, corrosion protection, and decorative finishes. They are ideal for semiconductor devices, optical coatings, cutting tools, and flat panel displays.

Q2: What purity and bonding types are available for Titanium Nitride sputtering targets?
A: TiN targets are commonly offered at a purity of 99.5%. Bonding options include Indium bonding and elastomeric bonding, which help improve thermal conductivity and mechanical stability during sputtering.

Q3: How should Titanium Nitride sputtering targets be handled to ensure optimal performance?
A: Due to the brittle nature of nitride targets, power should be ramped up and down slowly during sputtering to minimize thermal stress and cracking. Bonding the target to a backing plate is recommended to maintain target integrity and improve heat dissipation.

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Titanium Nitride Sputtering Target, TiN
Average rating:  
 3 reviews
by Michael L. on Titanium Nitride Sputtering Target, TiN

I used this TiN sputtering target for a recent thin film project, and it delivered consistent, high-quality results. The coating was smooth, and the target performed well throughout the process. It also arrived on time and in great condition. Would definitely consider ordering again.

by E. Johnson on Titanium Nitride Sputtering Target, TiN

This TiN target worked just as I needed. The material quality was solid, and the coating came out clean and uniform. The customer support team was quick to answer my questions, which made the whole experience hassle-free. A good purchase overall.

by Eric Garcetti on Titanium Nitride Sputtering Target, TiN

These titanium nitride targets are really nice. They're made from very good raw materials. They are really well-made.