Chemical Formula: TiN
Catalog Number: ST0217
CAS Number: 25583-20-4
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
The titanium nitride sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality titanium nitride sputter targets at the most competitive prices.
Stanford Advanced Materials (SAM) is your reliable source for premium titanium nitride (TiN) sputtering targets, composed of a ceramic material containing Ti and N. TiN is well-known for its extreme hardness and is often used as a high-performance coating on various substrates, including titanium alloys, steel, carbide, and aluminum, to enhance their surface properties. Our TiN sputtering targets are specifically engineered for use in the thin film deposition process, offering exceptional uniformity, adhesion, and wear resistance.
Related Product: Titanium Sputtering Target, Nitride Ceramic Sputtering Target
|Material Type||Titanium Nitride|
|Color/Appearance||Yellow-Brown, Crystalline Solid|
|Melting Point||2,930° C|
|Available Sizes||Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″
We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.
Our titanium nitride sputter coater targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
High-quality titanium nitride sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes. Please send us an inquiry for the current prices on the sputtering targets and other deposition materials that are not listed.
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These titanium nitride targets are really nice. They're made from very good raw materials. They are really well-made.