(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0175 Magnesium Oxide Sputtering Target, MgO

Chemical Formula: MgO
Catalog Number: ST0175
CAS Number: 1309-48-4
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Stanford Advanced Materials (SAM) is experienced in providing the best magnesium oxide sputtering targets on the market. We also customize various shapes according to your requirements or drawings.




Description

Magnesium Oxide Sputtering Target Description

Magnesium oxide sputtering target from Stanford Advanced Materials is an oxide sputtering material containing Mg and O.

MagnesiumMagnesium is a chemical element that originated from Magnesia, a district of Eastern Thessaly in Greece. It was first mentioned in 1755 and observed by J. Black. The isolation was later accomplished and announced by H. Davy. “Mg” is the canonical chemical symbol of magnesium. Its atomic number in the periodic table of elements is 12 with a location at Period 3 and Group 2, belonging to the s-block. The relative atomic mass of magnesium is 24.3050(6) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Magnesium Sputtering Target

OxygenOxygen is a chemical element that originated from the Greek ‘oxy’ and ‘genes’ meaning acid-forming. It was first mentioned in 1771 and observed by W. Scheele. The isolation was later accomplished and announced by W. Scheele. “O” is the canonical chemical symbol of oxygen. Its atomic number in the periodic table of elements is 8 with location at Period 2 and Group 16, belonging to the p-block. The relative atomic mass of oxygen is 15.9994(3) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Oxide Ceramic Sputtering Target

Magnesium Oxide Sputtering Target Specification

Material Type Magnesium Oxide
Symbol MgO
Color/Appearance White, Crystalline Solid
Melting Point 2,852 °C
Density 3.58 g/cm³
Sputter RF
Type of Bond Indium bonding
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

Magnesium Oxide Sputtering Target Handling Notes

1. Indium Bonding is recommended for magnesium oxide sputtering target. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services.

2. This material has a low thermal conductivity are susceptible to thermal shock.

Packaging

Our magnesium oxide sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Get Contact

SAM’s magnesium oxide sputtering targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.

Submit your review
1
2
3
4
5
Submit
     
Cancel

Create your own review

Magnesium Oxide Sputtering Target, MgO
Average rating:  
 1 reviews
by Jonathan Simonovic on Magnesium Oxide Sputtering Target, MgO

I bought 3 pieces 2.00″ Dia. x 0.125″ Thick MgO sputter target for my lab. They worked well for my sputtering experiment.