Chemical Formula: MgO
Catalog Number: ST0175
CAS Number: 1309-48-4
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Columns, Step Targets, Custom Designs
Stanford Advanced Materials (SAM) supplies high-purity magnesium oxide sputtering targets (MgO) designed for thin film deposition via RF magnetron sputtering. With excellent electrical insulation, chemical stability, and thermal resistance, MgO is a widely used dielectric and optical coating material in advanced PVD and CVD processes.
Our MgO targets are produced from high-density crystalline powder to ensure uniform sputtering, low particle generation, and reliable film performance. Custom shapes and sizes are available to meet your deposition system requirements.
Related Product: Magnesium Sputtering Target, Oxide Ceramic Sputtering Target
High Purity Magnesium Oxide Sputtering Target for Thin-film Coating
| Material Type | Magnesium Oxide (MgO) |
| Appearance | White crystalline solid |
| Purity Options | 99.9%, 99.95%, 99.99% |
| Density | 3.58 g/cm³ |
| Melting Point | 2,852 °C |
| Sputtering Method | RF sputtering |
| Recommended Bonding | Elastomer bonding or unbonded |
| Available Diameters | 1.0″ to 6.0″ |
| Available Thicknesses | 0.125″, 0.250″ |
Note: MgO is brittle and has low thermal conductivity. It is prone to thermal shock and may fracture under rapid temperature cycling. We recommend using mechanical clamping or elastomer bonding for high-stress conditions.
Magnesium oxide sputtering targets are used in a wide range of thin-film applications where insulating, transparent, or thermally resistant layers are required:
Semiconductor Devices
Gate dielectrics, barrier layers, and insulating films in transistor structures
Optical Coatings
Anti-reflective layers, UV filters, and dielectric mirrors for high-precision optics
Magnetic Storage Media
Protective and insulating layers in hard disk and magnetic recording devices
Electronics & Displays
Thin insulating coatings in LCDs, OLEDs, and other flat panel devices
Superconductors & Buffer Layers
Used as a stable substrate or buffer layer for YBCO and other epitaxial thin films
Due to MgO’s mechanical fragility, elastomer bonding is recommended for most applications. This flexible interface helps reduce stress transfer and cracking. SAM also offers:
Custom bonding configurations
Machined backing plates (e.g., Mo, CuCrZr)
Mechanical clamping assistance if bonding is not used
All MgO targets are vacuum-sealed and protected with anti-static foam to prevent contamination and mechanical damage during transportation. Clear labeling ensures full traceability and inventory control.
At Stanford Advanced Materials, we offer magnesium oxide sputtering targets in a range of forms, purities, sizes, and prices. We specialize in high-purity film coating materials that have the highest density and smallest average grain sizes, perfect for use in various applications such as semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) displays and optics. Our rigorous quality control process ensures that you receive the highest quality product from production to delivery. Contact us today to learn more about our magnesium oxide sputtering targets and how they can benefit your specific application. Submit your inquiry now to get started.
Submit your review | |
I bought 3 pieces 2.00″ Dia. x 0.125″ Thick MgO sputter target for my lab. They worked well for my sputtering experiment.
