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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0208 Aluminum Nitride Sputtering Target, AlN

Chemical Formula: AlN
Catalog Number: ST0208
CAS Number: 24304-00-5
Purity: 99.5%, 99.9%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

The aluminum nitride sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality aluminum nitride sputter targets at the most competitive prices.

Aluminum Nitride MSDS File




Description

Aluminum Nitride Sputtering Target Description

Aluminum nitride sputtering target from Stanford Advanced Materials is a ceramic sputtering material with the formula AlN.

AluminumAluminium, also called aluminum, is a chemical element that originated from the Latin name for alum, ‘alumen’ meaningbitter salt. It was first mentioned in 1825 and observed by H.C.Ørsted. The isolation was later accomplished and announced by H.C.Ørsted. “Al” is the canonical chemical symbol of aluminium. Its atomic number in the periodic table of elements is 13 with a location at Period 3 and Group 13, belonging to the p-block. The relative atomic mass of aluminium is 26.9815386(8) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Aluminum (Al) Sputtering Target

NitrogenNitrogen is a chemical element that originated from the Greek ‘nitron’ and ‘genes’ meaning nitre-forming. It was first mentioned in 1772 and observed by D. Rutherford. The isolation was later accomplished and announced by D. Rutherford. “N” is the canonical chemical symbol of nitrogen. Its atomic number in the periodic table of elements is 7 with a location at Period 2 and Group 15, belonging to the p-block. The relative atomic mass of nitrogen is 14.0067(2) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Nitride Ceramic Sputtering Target

Aluminum Nitride Sputtering Target Specification

Compound Formula AlN
Appearance White to pale yellow powder
Melting Point 2200 °C
Boiling Point 2517 °C
Density 2.9 to 3.3 g/cm3
Electrical Resistivity 10 to 12 10x Ω-m
Specific Heat 780 J/kg-K

Aluminum Nitride Sputtering Target Packaging

Our aluminum nitride sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

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High-quality aluminum nitride sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes. Please send us an inquiry for the current prices of the sputtering targets and other deposition materials that are not listed.

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Aluminum Nitride Sputtering Target, AlN
Average rating:  
 1 reviews
by Thelda Williams on Aluminum Nitride Sputtering Target, AlN

These are exactly what I wanted. Just like the description says, and were packaged so they were protected and shipped very nicely!