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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

Category

Planar Sputtering Target

Stanford Advanced Materials (SAM) provides a wide range of planar sputtering targets for large area deposition and other market applications.planar targets

Planar Target Manufacturing Methods

SAM provides standard and custom-made planar sputtering targets. We supply large stock Cr, Ag, Al, Si, Sn, Ti, Stainless steel, TiO2, W, Ta, Mo, Nb, Cu and other metal and alloy materials.

Cast: The planar sputtering targets can be cast directly to a backing plate or bonded. SAM provides material-specific re-casting service.

HIP/Hot-pressed/Sintered: SAM offers a range of targets made using powder-metallurgical and ceramic processing methods. These include, but are not limited to, ATO, AZO, Cr, ITO etc.

Rolled/Forged/Brazed: SAM provides custom engineering and unique thermo-mechanical process solutions (e.g., grain-size control) for various materials.

Planar Target Typical Sizes

 

Round Planar

Rectangular Planar

Size Diameter: 50.38 – 381mm (2 – 15 inches) Length: up to 1700mm (67 inches)

Width: up to 381mm (15 inches)

Thickness up to 15mm (0.591 inches) up to 15mm (0.591 inches)

We also offer customized shapes and sizes of planar sputtering targets, please send us an inquiry for more information.

Planar Target Products