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(949) 407-8904 Mon - Fri 09:00 - 18:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 09:00 - 18:00 23661 Birtcher Dr., Lake Forest, California, USA

Category

Planar Sputtering Target

Stanford Advanced Materials provides a wide range of planar targets for large area deposition and other market applications.planar targets

Manufacturing Methods of Planar Target

Stanford Advanced Materials provides the custom-made planar sputtering targets, mainly Cr, Ag, Al, Si, Sn, Ti, Stainless steel, TiO2, W, Ta, Mo, Nb, Cu and other metal and alloy materials.

Cast: Our product includes Mo, In alloys, Cu, Si, Ti alloys and other materials. Targets can be cast directly to a backing plate or bonded. SAM provides material-specific re-casting service.

HIP/Hot-pressed/Sintered: SAM offers a range of targets made using powder-metallurgical and ceramic processing methods. These include, but are not limited to, ATO, AZO, Cr, ITO etc.

Rolled/Forged/Brazed: SAM provides custom engineering and unique thermo-mechanical process solutions (e.g., grain-size control) for various materials, including Ag, Nb, NiCr, Ta and Zr.

Typical Sizes of Planar Target

 

Round Planar

Rectangular Planar

Size Diameter: 50.38 – 381mm (2 – 15 inches) Length: up to 1700mm (67 inches)

Width: up to 381mm (15 inches)

Thickness up to 15mm (0.591 inches) up to 15mm (0.591 inches)

We also offer customized shapes and sizes of planar sputtering targets, please send us an inquiry for more information.

Planar Target Products