Stanford Advanced Materials provides a wide range of planar targets for large area deposition and other market applications.
Stanford Advanced Materials provides the custom-made planar sputtering targets, mainly Cr, Ag, Al, Si, Sn, Ti, Stainless steel, TiO2, W, Ta, Mo, Nb, Cu and other metal and alloy materials.
Cast: Our product includes Mo, In alloys, Cu, Si, Ti alloys and other materials. Targets can be cast directly to a backing plate or bonded. SAM provides material-specific re-casting service.
HIP/Hot-pressed/Sintered: SAM offers a range of targets made using powder-metallurgical and ceramic processing methods. These include, but are not limited to, ATO, AZO, Cr, ITO etc.
Rolled/Forged/Brazed: SAM provides custom engineering and unique thermo-mechanical process solutions (e.g., grain-size control) for various materials, including Ag, Nb, NiCr, Ta and Zr.
|Size||Diameter: 50.38 – 381mm (2 – 15 inches)||Length: up to 1700mm (67 inches)
Width: up to 381mm (15 inches)
|Thickness||up to 15mm (0.591 inches)||up to 15mm (0.591 inches)|
We also offer customized shapes and sizes of planar sputtering targets, please send us an inquiry for more information.