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ZSBN Grade Boron Nitride- Solutions for Specialty Powder Metal Atomization

Specialty Powder Metals are made to a specific particle size distribution in small batches for specific alloys, such as common alloys of Nickel, Copper and Aluminum. Zirconia nozzles are commonly used for powder metal atomization. These are made by pressing and sintering large or coarse particles of Zirconia, lacking both tight tolerances and clean edges....
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titanium-dioxide

Recent study on higher deposition rate of Titanium oxide film

Titanium dioxide is a hard and chemically resistant oxide of titanium. TiO2 thin films have been widely used in various applications due to their multiple interesting properties. It has a high refractive index, which makes it attractive for the glass coating industry to produce low emissivity and antireflective coatings. It is interesting in microelectronics because...
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all-types-of-sputtering-target

High-purity Sputtering Target Guarantee the Film Quality

Sputtering is a method of physical vapor deposition (PVD) technologies and is one of the main techniques for preparing electronic thin film materials. It utilizes the ions generated by the ion source to accelerate the aggregation in a high vacuum to form an ion beam with high speed and high energy. The ion beam bombards...
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3 Important Applications of Gold Evaporation Materials

3 Important Applications of Gold Evaporation Materials

High-purity gold has excellent physical and chemical properties, such as low contact resistance and stability, easy bonding, and easy film formation. By adding other elements, gold can be alloyed to Gold Germanium, Gold Gallium and Gold Beryllium. The flow point of these materials can be changed, and their wettability and adhesion with different materials can...
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5 Points For Sputtering Target Maintenance

5 Points You Should Know in the Sputtering Target Maintenance

Sputtering Target Maintenance In order to avoid short circuit and arc initiation caused by the unclean cavity in the sputtering process, it is necessary to remove the accumulated sputtering materials deposited in the middle and on both sides of the sputtering track in stages. It is also helpful for users to continuously sputtering with the...
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Pyrolytic Boron Nitride Crucible

An Overview of Pyrolytic Boron Nitride (PBN)

About PBN Pyrolytic boron nitride is abbreviated as Pyrolytic BN or PBN, also known as Chemical vapor-deposited Boron Nitride, or CVD-BN, since PBN is mainly obtained by chemical vapor deposition. When it comes to boron nitride, we must talk about its two main structures: hexagonal and cubic. Hexagonal boron nitride and graphite are very similar...
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Various Types of Evaporation Pellets Materials

An Overview of Vacuum Evaporation

Vacuum evaporation is a process in which a solid material (referred to as the evaporating material) is heated in a high vacuum environment to be deposited on a specific substrate to obtain a film. The vacuum evaporation process is mainly used in microelectronics to make active components, device contacts and metal interconnections, high precision low-temperature...
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Elements used in one phone

Application of tantalum and molybdenum in mobile phones

Metal elements have many applications in mobile phones. And today we tend to mention two important ones–molybdenum and titanium. The main use of tantalum materials in electronic products comes in the creation of the tantalum capacitor; and the main use of molybdenum in mobile phones mainly related to the liquid crystal display coating: using magnetron...
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SAM Sputter Target Formula Specification (mm) Purity (%) Melting Point (℃) Density (g/cm3) Silicon monoxide SiO Powder, Lump, Pellet 99.99 / 2.1 Zirconium dioxide ZrO2 Ø10, Pellet 99.99 2812 9.7 Titanium dioxide TiO2 Ø30, Ø10, Pellet 99.99 1800 4.29 Silicon dioxide SiO2 Crystal Pellet 99.99 1610 2.2 Cerium oxide CeO2 Ø10, Pellet 99.99 2600 7.3...
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An Overview of Aluminum Sputtering Target

An overview of aluminum sputtering target

Aluminum sputtering target can be considered a product after a series of processes from high-purity aluminum. It is a type of sputtering materials used mounted on a vacuum coating machine to deposit a film in the vacuum coating industry. The property of the sputtering target directly affects the performance of the obtained film. Physical properties...
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