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Julissa Green
Difference between Resistive Screen and Capacitive Screen
Resistive touch screen is commonly called “soft screen”, which is mostly used in Windows Mobile system mobile phones; capacitive touch screen is commonly called “hard screen”, such as iPhone and G1 machines use this kind of screen quality. Indium tin oxide sputtering target is an important material for touch screens. For more information, please visit https://www.sputtertargets.net/. Resistive...
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Study on the Influence of Sputtering Targets on Sputter Coatings
AlxCr1-xN coatings have excellent mechanical properties and oxidation resistance and are therefore of high application value in a variety of industrial applications. In recent years, the effects of various deposition parameters (such as partial pressure, gas mixture or temperature) on the sputtering process have been studied, but there has been little research on the influence...
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Effect of Impurity Size on Superconducting Material
Researchers at North Carolina State University have been working hard to find the relationship between impurities and superconducting materials. Their research focuses on how the size of these impurities affects superconducting materials, and whether the effects are beneficial or harmful. A superconducting material is a material that can sustain electricity without losing any energy due...
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Effect of Silver Additives on the Conductivity of Indium Tin Oxide Sputtered Films
Transparent conductive films have many applications, and indium tin oxide films have received great attention in the glass manufacturing industry due to their excellent properties. However, the manufacturing process of the indium tin oxide film requires a higher temperature, which limits its application. In order to reduce this temperature, various “sintering agents” have been taken...
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PVD VS. CVD
Physical vapor deposition (PVD) and chemical vapor deposition (PVD) are considered to be the most attractive surface coating technologies and have a wide range of applications in various industries. Let us compare these two methods in detail. Physical Vapor Deposition Chemical Vapor Deposition Definition Physical vapor deposition (PVD) is a series of vacuum deposition methods...
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tantalum target semiconductor
Element Overview The texture of the tantalum is very hard and the hardness can reach 6-6.5. Its melting point is as high as 2996 ° C, only after carbon, tungsten, rhenium and osmium. Tantalum is malleable and can be drawn into a thin foil. Its coefficient of thermal expansion is very small, and it only expands by 6.6...
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sputtering target for electronics
Sputtering targets have important applications in many areas, such as architecture, optics, electronics and so on. Sputtering targets used in electronic industry can be subdivided into semiconductor target (also called anelva target), planar target, coated glass target, solar photovoltaic target, and so on. There are some differences in the selection and performance requirements of sputtering materials in different application fields....
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Semiconductor wafers are the basic material for manufacturing electronic chips. The most important raw material for semiconductor integrated circuits is silicon, which is widely found in rocks and gravels in the form of silicates or silica in nature. The fabrication process of semiconductor silicon wafers can be divided into three basic steps: silicon purification and...
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Sputtering targets are a physical vapor deposition (PVD) mechanism with many uses in modern technology and manufacturing. In the sputtering process, the atoms are pulled from the sputter target with powerful magnets, and a controlled gas (usually argon) is introduced. Then, the processed to collide with each other in their gaseous state before condensing into...
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