(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

Sputter Target by Target Materials

What Is Sputtering Deposition?

Sputtering deposition, or sputter coating, is one of the physical vapor deposition technology, whereby sputtering target particles are ejected from a solid sputtering material due to the bombardment of the target by energetic particles. It is an electronic process that deposits thin films of metals or other materials onto a variety of surfaces.

SAM’s Sputtering Materials

Our ISO 9001 certified Materials Division stocks a vast assortment of high-purity sputtering target materials. We offer pure elements, compounds, alloys, ceramics, intermetallics, and mixtures for both R&D and Production applications. Each sputtering target ships complete with a Certificate of Analysis and SDS. We also provide in-house sputter target bonding and precious metals reclamation services, saving you both time and money.

SAM offers a wide range of sputtering materials for the vacuum deposition industry. Our materials are of various purities, ranging from 99.9% to 99.9999%. Available forms include Discs, Plates, Column Targets, Step Targets, and Custom-made.

Indium Sputtering Target, In

Metal sputtering targets are usually made from highly pure metals. They are the most widely used and fundamental coating materials for other sputter deposition technology. 

Titanium Sputtering Target, Ti

Alloy sputtering targets are materials composed of one metal and other metals or non-metals while still showing the some metallic characteristics. 

Aluminum Oxide Sputtering Target, Al2O3

Common oxide ceramics sputtering targets of this type involve aluminum oxide (Al2O3), magnesium oxide (MgO), beryllium oxide (BeO), zirconium oxide (ZrO2).

Zirconium Nitride Sputtering Target

Silicon nitrides (Si3N4) feature an excellent combination of material properties. They are nearly as light as silicon carbide (SiC).

N-type Silicon Sputtering Target (N-doped Si)

Stanford Advanced Materials manufactures & supplies silicide Ceramic sputtering materials in various sizes and shapes.

Fluoride targets

Stanford Advanced Materials (SAM) supplies evaporation materials of fluoride ceramic in various sizes and shapes.

Tantalum Carbide Sputtering Target, TaC

Carbide ceramics are extremely resistant to high temperature, abrasion, and corrosion. They have a high thermal and variable electrical conductivity.

Antimony Sulfide Sputtering Target, Sb2S3

Sulfide ceramic sputtering targets are used in the semiconductor industry to make thin film deposition from different materials for processing of integrated circuits.

Boron Sputtering Target, B

Boride Ceramic sputtering target for polishing carbide and hardened mold surfaces. Perfect for polishing ribs, slots and sidewalls.

zinc selenide

SAM offers selenide-ceramic sputtering target with 99.9%, 99.95%, 99.99%, 99.995%, 99.999% purity in various shapes & sizes for thin-film coating.

Antimony Sulfide Sputtering Target, Sb2S3

SAM can customize telluride ceramic targets with specific chemical compositions and geometric sizes. 

Lanthanum Fluoride Sputtering Target, LaF3

In most of cases, people use relative purity such as REO(Rare earth oxide) and REM(Rare Earth Metal) to represent the purity for rare earth elements. 

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