All for Joomla All for Webmasters
(949) 407-8904 Mon - Fri 09:00 - 18:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 09:00 - 18:00 23661 Birtcher Dr., Lake Forest, California, USA

By Target Materials

Our ISO 9001 certified Materials Division stocks a vast assortment of high purity materials, evaporation sources, and crucible liners for use in both thermal and E-beam evaporation as well as sputter deposition processes. We offer pure elements, compounds, alloys, ceramics, intermetallics, and mixtures in a variety of shapes, sizes, and purities for both R&D and Production applications. Each sputtering target and evaporation material ships complete with a Certificate of Analysis and SDS. We also provide in-house sputter target bonding and precious metals reclamation services, saving you both time and money. Planar sputtering Targets are widely used in many applications, including Flat Panel Display, Large Area Coating, Photovoltaics, Decorative Coating, Crystal Oscillator, Magnetic Storage, Optical Discs, Optoelectronics, Semiconductor, Wear-Resistant Coating.
indium sputtering target

Metal sputtering targets are usually made from highly pure metals. They are the most widely used and fundamental coating materials for other sputter deposition technology. 

Titanium Sputtering Target

Alloy sputtering targets are materials composed of one metal and other metals or non-metals while still showing the some metallic characteristics. 

Aluminum Oxide (Al2O3) Sputtering Target

Common oxide ceramics sputtering targets of this type involve aluminum oxide (Al2O3), magnesium oxide (MgO), beryllium oxide (BeO), zirconium oxide (ZrO2).

Zirconium Nitride Sputtering Target

Silicon nitrides (Si3N4) feature an excellent combination of material properties. They are nearly as light as silicon carbide (SiC).

silicon sputtering target

Stanford Advanced Materials manufactures & supplies silicide Ceramic sputtering materials in various sizes and shapes.

Fluoride targets

Stanford Advanced Materials (SAM) supplies evaporation materials of fluoride ceramic in various sizes and shapes.

boron carbide sputtering target

Carbide ceramics are extremely resistant to high temperature, abrasion, and corrosion. They have a high thermal and variable electrical conductivity.

Sb2S3 Sputtering Target

Sulfide ceramic sputtering targets are used in the semiconductor industry to make thin film deposition from different materials for processing of integrated circuits.

Boron (B) Sputtering Target

Boride Ceramic sputtering target for polishing carbide and hardened mold surfaces. Perfect for polishing ribs, slots and sidewalls.

zinc selenide

SAM offers selenide-ceramic sputtering target with 99.9%, 99.95%, 99.99%, 99.995%, 99.999% purity in various shapes & sizes for thin-film coating.

Sb2S3 Sputtering Target

SAM can customize telluride ceramic targets with specific chemical compositions and geometric sizes. 

Lutetium Oxide (Lu2O3) Sputtering Target

In most of cases, people use relative purity such as REO(Rare earth oxide) and REM(Rare Earth Metal) to represent the purity for rare earth elements. 

Product Categories