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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0185 Silicon Dioxide Sputtering Target, SiO2

Chemical Formula: SiO2
Catalog Number: ST0185
CAS Number: 7631-86-9
Purity: 99.9%, 99.95%, 99.99%, 99.995%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Silicon dioxide sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high quality silicon oxide sputter target at the most competitive price.

Silicon Oxide Sputtering Target Safety Data Sheet

 




Description

Silicon Dioxide Sputtering Target Description

Oxygen

Silicon

Silicon dioxide sputtering target from Stanford Advanced Materials contains Si and O. Silicon dioxide (SiO2), also known as Silica, is a natural compound made from two of the most abundant materials on the planet: silicon (Si) and oxygen (O2). Silica is most commonly considered to be in the form of quartz. It exists naturally in water, plants, animals and the earth. 59% of the earth’s crust is composed of silicon dioxide. In addition, it also forms more than 95% of the known rocks on Earth. Here is the structure of SiO2.

silicon dioxide chemical structure
Silicon Dioxide Sputtering Target Chemical Structure

Silicon Dioxide Sputtering Target Specification

Material Type Silicon (IV) Oxide
Symbol SiO2
Color/Appearance White, Crystalline Solid
Melting Point (°C) 1,610
Boiling Point (°C) 2,230
Density (kg/m-3) 2,533
Sputter RF
Type of Bond Indium, Elastomer
Comments Quartz excellent in E-beam.
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.

Silicon Dioxide Sputtering Target Bonding Service

Indium Bonding and Elastomeric Target Bonding Service are available for silicon dioxide sputtering target. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.

Target Bonding Services

Silicon Dioxide Sputtering Target Packaging

Our silicon oxide sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Get Contact

High quality silicon dioxide sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.

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Silicon Dioxide (SiO2) Sputtering Target
Average rating:  
 1 reviews
by Geek Family on Silicon Dioxide (SiO2) Sputtering Target

I needed sputtering targets for a experiment project, and these little guys did not disappoint me. Satisfied with SAM's products.