Most Popular

Introduction Chemical Vapor Deposition (CVD) might sound like an obscure lab technique, but it’s the invisible engine behind modern technology. It’s what makes your smartphone processor faster, your new sunglasses more scratch-resistant, and a jet engine withstand infernal temperatures. In essence, CVD is the art of turning a gas into a perfect solid coating, and...Continue Reading

Rare-earth element is a general term for 17 elements of lanthanides as well as scandium and yttrium in the chemical periodic table. Scandium and yttrium are included in rare earth element because they are often symbiotic with lanthanide elements in mineral deposits, and thus have similar chemical properties. Rare earth materials are important for many...Continue Reading

1. The Core Difference at a Glance Before diving deep, here is the fundamental distinction: PVD (Physical Vapor Deposition): A physical process. A solid material is vaporized in a vacuum and then condenses as a thin film on the substrate. Think of it as transferring material atom-by-atom. CVD (Chemical Vapor Deposition): A chemical process. Gaseous precursors react or decompose on the...Continue Reading

1. Introduction to Sputtering Targets Sputtering targets are significant commodities for thin-film industries like electronics, optics, and energy sectors. Simply put, a “sputtering target” is the target material utilized for sputtering, a form of physical vapor deposition (PVD). During the PVD process, atoms from a solid target are removed and ejected upon impact by high-energy...Continue Reading

Ion Beam Sputtering Definition Ion beam sputtering (IBS), or ion beam deposition (IBD), is a thin film deposition technology that uses an ion source to deposit a sputtering target onto a substrate to produce the highest quality films with excellent precision. Compared to other PVD technologies, ion beam sputtering is more accurate and can accurately control...Continue Reading

Magnetron sputtering is a physical vapor deposition method that allows the deposition of various materials, including metals, oxides, ceramics and etc., by using a specially formed magnetic field applied to a diode sputtering target. The deposition rate, or the film formation rate, is an important parameter that measures the effectiveness of the magnetron sputtering machine....Continue Reading