| Chemical Formula | Ti/Nb |
| Catalog No. | ST0890 |
| Purity | 99.9%, 99.95%, 99.99%, 99.995%, 99.999% |
| Shape | Discs, Plates, Column Targets, Step Targets, Custom-made |
The Niobium Titanium Sputtering Target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality Niobium Titanium Sputtering Target at the most competitive prices.
Niobium Titanium Sputtering Target is a material used in the process of sputtering, which is a technique widely employed in the field of thin film deposition. Sputtering is the process of ejecting atoms or ions from a solid target material through bombardment with high-energy particles, usually ions. The ejected particles are then deposited onto a substrate to form a thin film.
| Compound Formula | Ti/Nb |
| Appearance | Gray metallic target |
| Molecular Weight | 140.773 |
| Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
Niobium Titanium Sputtering Target is widely used in semiconductors, superconductors, sensor technologies, optical coatings, and many other fields where precise thin film deposition is required.
Our Niobium Titanium Sputtering Targets are carefully handled during storage and transportation to preserve the quality of our products in their original condition.
SAM’s Niobium Titanium Sputtering Targets are available in various forms, purities, and sizes. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.
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