Chemical Formula: Nb
Catalog Number: ST0033
CAS Number: 7440-3-1
Purity: 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
High purity niobium sputtering targets of high quality are supplied by Stanford Advanced Materials (SAM) for deposition of thin films through DC magnetron sputtering. Due to good thermal conductivity, chemical stability, and superconducting potential, niobium is commonly used in microelectronics, optical coating, energy storage, and the manufacturing of superconducting devices.
Our niobium targets are available in a variety of sizes and purities, and can be bonded onto a backing plate upon request.
Related Product: Titanium Sputtering Target
Niobium Sputtering Target Safety Data Sheet
High Purity Niobium for Thin-film Applications
| Symbol | Nb |
| Appearance | Gray, metallic |
| Purity | 99.95%, 99.99% |
| Density | 8.57 g/cm³ |
| Melting Point | 2,468 °C |
| Sputtering Method | DC |
| Available Sizes | Dia. 1–6″, Thickness 0.125–0.25″ |
| Bonding Methods | Indium (recommended), Elastomer |
| Backing Plates | Copper (standard), Molybdenum, Stainless Steel |
| Custom Shapes | Available on request |
Niobium sputtering targets are employed primarily for the deposition of thin films in the following areas:
Semiconductor Devices
Niobium thin films are employed as diffusion barriers, conducting films, and superconducting parts.
Superconducting Coatings
Thin films of Nb, NbTi, and Nb₃Sn are utilized in a significant part of MRI systems, particle accelerators, and quantum devices.
Optical Coatings & Filters
Applied in multilayer stacks for reflective or interference filters of optical systems.
Energy Storage Systems
Upcoming applications in battery coatings, fuel cell membranes, and hydrogen storage materials.
To achieve the best heat transfer and target integrity in sputtering, SAM provides expert bonding services:
Indium Bonding (Recommended)
Ideal for DC sputtering of high power with excellent thermal contact and removability.
Elastomer Bonding
If mechanical flexibility or low-temperature bonding is required by your system, it is available.
Backing plates available in copper, molybdenum, and other materials as per system requirements.
All niobium targets are foam-padded and vacuum-sealed to give ultimate protection during shipping. All of them are correctly labeled for full traceability. We ensure that every product meets extremely high material purity and dimension requirements.
High purity niobium sputtering target is available in a variety of forms, purities, sizes and price. We specialize in producing high purity thin film coating material with the highest possible density and lowest possible average grain sizes for semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Contact us for up to date pricing on sputtering targets and other deposition materials that are not listed on this web page.
Submit your review | |
The niobium targets were used for optical multilayer coatings in our thin-film lab. Film uniformity and adhesion were both very good, and sputtering performance was stable. I appreciate that SAM offers both indium and elastomer bonding options, which gives flexibility depending on the system setup. My only small drawback was that the lead time for custom sizes was slightly longer than expected, but the quality definitely justified it.
We’ve been using niobium sputtering targets from SAM for superconducting film deposition in our quantum device research. The purity (99.99%) has been consistent across batches, and we’ve achieved very smooth, dense coatings with no detectable contamination.
Quick delivery and good package. Perfect for film coating and sputter deposition.
