ST0033 Niobium (Nb) Sputtering Target

Target Bonding of Niobium Sputtering Target

Indium Bonding and Elastomeric Target Bonding Service are available for Niobium sputtering target. Stanford Advanced Materials (SAM) is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.

Specifications of Niobium Sputtering Target

Available Sizes of Niobium Sputtering Target

We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.

Description of Niobium Sputtering Target

Niobium is a chemical element originated from Niobe, daughter of king Tantalus from Greek mythology. It was first mentioned in 1801 and observed by C. Hatchett. The isolation was later accomplished and announced by W. Blomstrand. “Nb” is the canonical chemical symbol of niobium. Its atomic number in the periodic table of elements is 41 with location at Period 5 and Group 5, belonging to the d-block. The relative atomic mass of niobium is 92.906 38(2) Dalton, the number in the brackets indicating the uncertainty.

Packing

The Niobium sputtering targets from Stanford Advanced Materials are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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SAM’s Niobium sputter targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.