Chemical Formula: Nb
Catalog Number: ST0033
CAS Number: 7440-3-1
Purity: 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Stanford Advanced Materials (SAM) offers high-purity niobium sputtering targets for thin film deposition via DC magnetron sputtering. With excellent thermal conductivity, chemical stability, and superconducting potential, niobium is widely used in microelectronics, optical coatings, energy storage, and superconducting device fabrication.
Our niobium targets are available in various sizes and purities, and can be bonded to a backing plate upon request.
Related Product: Titanium Sputtering Target
Niobium Sputtering Target Safety Data Sheet
High Purity Niobium for Thin-film Applications
| Symbol | Nb |
| Appearance | Gray, metallic |
| Purity | 99.95%, 99.99% |
| Density | 8.57 g/cm³ |
| Melting Point | 2,468 °C |
| Sputtering Method | DC |
| Available Sizes | Dia. 1–6″, Thickness 0.125–0.25″ |
| Bonding Methods | Indium (recommended), Elastomer |
| Backing Plates | Copper (standard), Molybdenum, Stainless Steel |
| Custom Shapes | Available on request |
Niobium sputtering targets are primarily used for thin film deposition in the following areas:
Semiconductor Devices
Niobium films serve as diffusion barriers, conductive layers, and superconducting elements.
Superconducting Coatings
Nb, NbTi, and Nb₃Sn thin films are critical for MRI systems, particle accelerators, and quantum devices.
Optical Coatings & Filters
Used in multilayer stacks for reflective or interference filters in optical systems.
Energy Storage Systems
Emerging use in battery coatings, fuel cell membranes, and hydrogen storage materials.
To ensure optimal heat transfer and target integrity during sputtering, SAM offers professional bonding services:
Indium Bonding (Recommended)
Ideal for high-power DC sputtering, providing excellent thermal contact and ease of removal.
Elastomer Bonding
Available for systems requiring mechanical flexibility or low-temperature bonding.
Backing plates are available in copper, molybdenum, and other materials per system requirements.
Each niobium target is vacuum-sealed and foam-cushioned for maximum protection during shipping. All items are clearly labeled for full traceability. We ensure that every product meets strict material purity and dimensional specifications.
High purity niobium sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.
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Quick delivery and good package. Perfect for film coating and sputter deposition.
