Chemical Formula: Al
Catalog Number: ST0001
CAS Number: 7429-90-5
Purity: 99.99%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Aluminum sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is your one-stop source to find aluminum sputter targets for sale.
Aluminum Sputtering Target Safety Data Sheet
Aluminum sputtering target has the same properties as metal aluminum. Aluminum, or Aluminium, is a silvery-white, soft, non-magnetic and ductile metal in the boron group. Aluminum layers form a reflective coating found on telescopes, automotive headlamps, mirrors, packages, and toys. Aluminum sputter targets and aluminum evaporation materials are widely used in the aerospace, automotive lighting, OLED, and optical industries.
Related Post: An Overview of Aluminum Sputtering Target
| Material Type | Aluminum |
| Symbol | Al |
| Color/Appearance | Silvery, Metallic |
| Melting Point | 660°C |
| Density | 2700 kg/m3 |
| Sputter | DC |
| Type of Bond | Indium, Elastomer |
| Comments | Alloys W/Mo/Ta. Flash evap or use BN crucible |
| Available Sizes | Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ |
Which purity to choose?
We also offer other customized shapes and sizes of the sputtering targets. Please send us an inquiry for more information.
Aluminum has good thermal properties and is malleable and ductile. Aluminum and its alloy are widely used for various applications including aircraft assemblies and engine parts. The aluminum sputtering target is used for thin film deposition, typically for fuel cells, decoration, semiconductors, displays, LED and photovoltaic devices, glass coating, etc.
Indium Bonding and Elastomeric Target Bonding Services are available for aluminum sputter targets. Stanford Advanced Materials (SAM) is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.
High-purity aluminum targets are produced from 99.99%+ raw material using controlled forging and rolling processes to achieve fine grain structure and high density. SAM offers competitively priced targets with consistent quality.
[Read more about aluminum target manufacturing →]
Our aluminum sputter targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
SAM’s aluminum sputtering targets are available in various forms, purities, sizes, and prices. We specialize in producing high-purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for the current prices of sputtering targets and other deposition materials that are not listed.
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Perfect for my R&D lab's OLED coating experiments. Consistent deposition and good value for the price.
Thank you for your support! SAM will continue to provide high-quality product for all customers!
Used this target for a university research project on thin-film deposition. The 99.999% purity worked well for our semiconductor application. Shipping was quick and the target arrived in perfect condition.
