All for Joomla All for Webmasters
(949) 407-8904 Mon - Fri 09:00 - 18:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 09:00 - 18:00 23661 Birtcher Dr., Lake Forest, California, USA

Cornerstone Articles

Major Problems and Answers in Coating Technology

Major Problems and Answers in Coating Technology

1. What kind of coating technology can be divided into? (1) Vacuum coating (2) Electroplating (3) Chemical reaction (4) Heat treatment (5) Physical or mechanical treatment 2. What are the applications of plasma technology in surface technology? Sputter deposition: Sputtering is the use of high-speed ions to strike a solid sputter target, causing surface molecules...
Continue Reading
tantalum target semiconductor

An Overview of Tantalum Element

Element Overview The texture of the tantalum is very hard and the hardness can reach 6-6.5. Its melting point is as high as 2996 ° C, only after carbon, tungsten, rhenium and osmium. Tantalum is malleable and can be drawn into a thin foil. Its coefficient of thermal expansion is very small, and it only expands by 6.6...
Continue Reading
What is Physical Vapor Deposition

What is Physical Vapor Deposition (PVD)?

What is PVD Coating Technology? Physical Vapor Deposition (PVD) is a thin film preparation technique that physically vaporizes the surface of a material source (solid or liquid) into gaseous atoms, molecules or partially ionized into ions under vacuum conditions. Then, a film having a specific function is deposited on the surface of the substrate by...
Continue Reading
everything about titanium sputtering target

Everything You Need to Know About Titanium Sputtering Target

Metal titanium and titanium sputtering target are essentially the same, both of which are composed of titanium element; the difference is that metal titanium is more like a raw material, and titanium target is more like a titanium product. Titanium as a raw material can be made into titanium sputtering targets by several methods, and...
Continue Reading
an-overview-of-sputtering-deposition

An Overview of Sputtering Deposition

Definition What is Sputtering Deposition? Sputtering deposition, or sputter coating, is one of the physical vapor deposition technology, whereby particles are ejected from a solid target material due to bombardment of the target by energetic particles. It is an electronic process that deposits thin films of metals or other materials onto a variety of surfaces. Most often,...
Continue Reading

The Importance of Film Coating for Semiconductors

The Semiconductor Market: Opportunities and Threats From both of the perspective of technology or economic development, the importance of semiconductors is enormous. Most of today’s electronic products, such as computers, mobile phones or digital recorders, have a very close relationship with semiconductors. Along with the rapid development, the semiconductor market also faces some challenges. First,...
Continue Reading
Sputtering Target in the Solar Applications

Sputtering Target in the Solar Application

The sputtering target is a new type of coating material (compared to evaporation materials) that is critical for thin-film solar cell coatings in the solar industry. Solar cell thin-film coating A thin-film solar cell is a second generation solar cell that is made by depositing one or more thin layers, or thin film (TF) of...
Continue Reading
Good Experimental and Industrial Crucible Materials

Good Experimental and Industrial Crucible Materials

The crucible is an important vessel for scientific experiments as well as industrial productions. It is a pot that is used to keep metals for melting in a furnace. So furnace crucibles are usually designed to withstand the highest temperatures encountered in the metal casting works, which means the crucible should essentially be made of...
Continue Reading
1 2 3