Chemical Formula: Al2O3
Catalog Number: ST0129
CAS Number: 1344-28-1
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Aluminum oxide sputtering target is available in various forms, purities, sizes, and prices in Stanford Advanced Materials. SAM has two decades’ experience in supplying alumina sputtering targets to fulfill most of your requirements.
Aluminum oxide sputtering target from Stanford Advanced Materials contains Al and O, and it has the same properties as aluminum oxide. Aluminum oxide, or Al2O3, is the most commonly occurring of several aluminum oxides, and specifically identified as aluminum (III) oxide. The aluminum oxide sputter target is commonly called alumina sputter target, and may also be called aloxide target, aloxite target, or alundum target, depending on particular forms or applications. Al2O3 occurs naturally in its crystalline polymorphic phase α-Al2O3 as the mineral corundum, varieties of which form the precious gemstones ruby and sapphire.
|Chemical Compound||Aluminum Oxide|
|Color/Appearance||White, Crystalline Solid|
|Melting Point||2,072 °C|
|Theoretical Density||3.97 g/cc|
|Type of Bond||Indium|
|Available Sizes||Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″
Aluminum oxide sputtering target is used for thin film deposition, typically for fuel cell, decoration, semiconductor, display, LED and photovoltaic devices, glass coating, etc. The major uses of specialty aluminum oxides are in refractories, ceramics, polishing and abrasive applications. Large tonnages of aluminum hydroxide, from which alumina is derived, are used in the manufacture of zeolites, coating titania pigments, and as a fire retardant/smoke suppressant.
Alumina sputter targets can be bonded by Indium Bonding. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.
Aluminum oxide sputtering targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
High purity Al2O3 sputtering targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.
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Product delivered just as requested and easy to put together. Will buy again. Great customer service.