Chemical Formula: Al2O3
Catalog Number: ST0129
CAS Number: 1344-28-1
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Al2O3 is the most commonly occurring of several aluminum oxides, and specifically identified as aluminum (III) oxide. It is commonly called alumina and may also be called aloxide, aloxite, or alundum depending on particular forms or applications. It occurs naturally in its crystalline polymorphic phase α-Al2O3 as the mineral corundum, varieties of which form the precious gemstones ruby and sapphire.
|Material Type||Aluminum Oxide|
|Color/Appearance||White, Crystalline Solid|
|Melting Point (°C)||2,072|
|Theoretical Density (g/cc)||3.97|
|Type of Bond||Indium|
|Available Sizes||Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″
Known as alundum (in fused form) or aloxite in the mining, ceramic, and materials science communities, aluminium oxide finds wide use. Annual world production of aluminium oxide in 2015 was approximately 115 million tonnes, over 90% of which is used in the manufacture of aluminium metal. The major uses of speciality aluminium oxides are in refractories, ceramics, polishing and abrasive applications. Large tonnages of aluminium hydroxide, from which alumina is derived, are used in the manufacture of zeolites, coating titania pigments, and as a fire retardant/smoke suppressant. The aluminum oxide sputtering target is used for thin film coating.
Indium Bonding is recommended for Aluminum Oxide (Al2O3) Sputtering Target. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.
Our Aluminum Oxide Sputtering Target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
SAM specializes in producing high purity Aluminum Oxide Sputtering Target with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.
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Product delivered just as requested and easy to put together. Will buy again. Great customer service.