Chemical Formula: Al2O3
Catalog Number: ST0129
CAS Number: 1344-28-1
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Aluminum oxide sputtering target is available in various forms, purities, sizes, and prices in Stanford Advanced Materials. SAM has two decades’ experience in supplying alumina sputtering targets to fulfill most of your requirements.
Aluminum Oxide Sputter Target Safety Data Sheet
High Purity Al2O3 for Thin-film Application
Stanford Advanced Materials (SAM) offers high-purity aluminum oxide (Al₂O₃) sputtering targets, also known as alumina sputtering targets, for thin film deposition via RF magnetron sputtering. As a chemically stable, wide-bandgap ceramic material, Al₂O₃ is ideal for use in insulating, dielectric, and optical coatings.
Our alumina targets are fabricated with high density and ultra-fine microstructure, ensuring low arcing, stable deposition rates, and uniform thin film quality.
| Property | Value |
|---|---|
| Compound | Aluminum Oxide (Al₂O₃) |
| Appearance | White, crystalline solid |
| Purity Options | 99.9%, 99.95%, 99.99% |
| Melting Point | 2,072 °C |
| Theoretical Density | 3.97 g/cm³ |
| Z Ratio | 0.336 |
| Sputtering Method | RF, RF-R |
| Available Sizes | Dia. 1″–6″, Thick. 0.125″–0.25″ |
| Bonding Methods | Indium (standard), Elastomer |
| Custom Shapes | Available upon request |
Note: Al₂O₃ is an electrical insulator and requires RF sputtering systems.
Aluminum oxide sputtering targets are widely used in:
Semiconductor Devices
Gate dielectrics, passivation layers, and diffusion barriers.
Display & LED Coatings
Transparent dielectric films for TFTs, OLEDs, and LEDs.
Photovoltaics
Surface passivation and insulating layers in solar cells.
Protective Optical Coatings
High-durability layers for lenses, mirrors, and AR coatings.
Decorative & Anti-corrosive Films
Durable oxide films for consumer electronics and automotive trim.
Al₂O₃ targets are brittle ceramic materials and are typically bonded for secure operation in high-power systems. We offer:
Indium Bonding – High thermal conductivity, easy to remove
Elastomer Bonding – Flexible interface for stress-sensitive systems
Custom backing plates – Copper, molybdenum, stainless steel available
All alumina targets are cleanroom-packaged, sealed against moisture, and foam-protected to prevent cracking or contamination. Batch COA and purity certificates are provided with every shipment.
High-purity Al2O3 sputtering targets are available in various forms, purities, sizes, and prices. We specialize in producing high-purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.
Submit your review | |
Our lab required a non-standard 99.99% alumina disc with precise dimensions and elastomer bonding. SAM delivered exactly as needed, on time. We’ve since standardized on their Al₂O₃ targets across our sputter tools.
Product delivered just as requested and easy to put together. Will buy again. Great customer service.
