Chemical Formula: Ti/W
Catalog Number: ST0117
CAS Number: 58397-70-9
Purity: 99.9%, 99.95%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Titanium tungsten sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high quality titanium tungsten sputter targets at the most competitive price.
Titanium tungsten sputtering target from Stanford Advanced Materials is an alloy sputtering material containing Ti and W. Thus, titanium-tungsten sputter target has the advantages of these two elements.
Titanium is a Group IV transition metal that has enjoyed great interest as one of the most important biocompatible metals, thanks to a suite of suitable biological and biomechanical properties. It is a lustrous transition metal with a silver color, low density, and high strength. Titanium is resistant to corrosion in seawater, aqua regia, and chlorine.cIts strong, lightweight characteristics and excellent corrosion resistance make it ideal for ocean liner hulls, aircraft engines, and designer jewelry.
Related Product: Titanium Sputtering Target
Tungsten, also called wolfram, is a chemical element that originated from the Swedish ‘tung sten’ meaning heavy stone(W is wolfram, the old name of the tungsten mineral wolframite). It is a greyish-white lustrous metal, which is solid at room temperature. Tungsten has the highest melting point and lowest vapor pressure of all metals. It has excellent corrosion resistance and is attacked only slightly by most mineral acids.
Related Product: Tungsten Sputtering Target
|Appearance||Metallic solid in various forms (plate, bar, sheet, strip, powder, foil)|
|Exact Mass||231.90 g/mol|
|Available Sizes||Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 6.0″
Thick: 0.125″, 0.250″
We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.
Indium Bonding and Elastomeric Target Bonding Service are available for the metal alloy Ti/W sputtering target. Stanford Advanced Materials (SAM) is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.
The titanium tungsten sputtering materials are used for CD-ROM, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Our metal alloy titanium tungsten sputter coater targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
High quality titanium tungsten sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.
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