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(949) 407-8904 Mon - Fri 09:00 - 18:00 23661 Birtcher Dr., Lake Forest, California, USA

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Julissa Green
What is Physical Vapor Deposition
What is PVD Coating Technology? Physical Vapor Deposition (PVD) is a thin film preparation technique that physically vaporizes the surface of a material source (solid or liquid) into gaseous atoms, molecules or partially ionized into ions under vacuum conditions. Then, a film having a specific function is deposited on the surface of the substrate by...
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everything about titanium sputtering target
Metal titanium and titanium sputtering target are essentially the same, both of which are composed of titanium element; the difference is that metal titanium is more like a raw material, and titanium target is more like a titanium product. Titanium as a raw material can be made into titanium sputtering targets by several methods, and...
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Unbalanced magnetron sputtering Unbalanced magnetron sputtering uses unbalanced magnetron sputtering cathode, which refers to the unequal magnetic fluxes of the inner and outer magnetic pole sections of the cathode. The effect of the unbalanced magnetic field is to trap fast moving secondary electrons that escape from the target surface. These electrons undergo ionizing collisions with...
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advantages-and-disadvantages-of-ion-beam-sputtering
Ion Beam Sputtering Definition Ion beam sputtering (IBS), or ion beam deposition (IBD), is a thin film deposition technology that uses an ion source to deposit a sputtering target onto a substrate to produce the highest quality films with excellent precision. Compared to other PVD technologies, ion beam sputtering is more accurate and can accurately control...
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semiconductor-wafer-2019
What are the three generations of Semiconductor Materials? The first generation of semiconductor material The first generation of semiconductor materials mainly refers to silicon (Si) and germanium (Ge) materials. In the 1950s, Ge dominated the semiconductor market and was mainly used in low-voltage, low-frequency, medium-power transistors and photodetectors. However, Ge semiconductor devices were inferior in...
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Applications of Sputtering Target
The sputtering target refers to the sputtering source that is deposited on a substrate to form various functional films under appropriate process conditions. Sputtering targets are widely used in many fields such as decoration, tooling, glass, electronic devices, semiconductors, and solar cells. Sputtering targets required in different fields vary. They can be classified into pure...
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Year in Review- 2018 Top Posts
Happy new year, my dear friends. We are very happy with your company and encouragement. SAM Sputter Target’s website has not been established for a long time, but we always insist on updating the news and knowledge about targets and coatings every week. On the occasion of the arrival of 2019, let us summarize the...
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Ultra low radiation coated glass building
Ultra low radiation silver-coated glass production process Low-emission coated glass has now been widely accepted by the public that this kind of glass is widely used in automobiles, doors and windows, and glass curtain walls. The core functional layer for low-emission coated glass is a silver film or silver-doped alloy film layer, which bears the...
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sputtering-target-purity
Effect of Sputtering Target Purity on Large-Area Coating Production The requirement of the target quality for sputter coating is higher than that of the traditional materials industry. When the substrate enters the high vacuum coating chamber, if the sputtering target is not pure enough, under the action of the electric field and the magnetic field,...
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