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(949) 407-8904 Mon - Fri 09:00 - 18:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 09:00 - 18:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0209 Boron Nitride (BN) Sputtering Target

Chemical Formula: BN
Catalog Number: ST0209
CAS Number: 10043-11-5
Purity: >99.5%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made




Description

Target Bonding of Boron Nitride Sputtering Target

Indium Bonding and Elastomer Bonding are recommended for Boron Nitride (BN) Sputtering Target. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.

Target Bonding Services

Specification of Boron Nitride Sputtering Target

Material Type Boron Nitride
Symbol BN
Color/Appearance White, Crystalline Solid
Melting Point ~3,000 °C
Theoretical Density  2.25 g/cc
Sputter RF, RF-R
Type of Bond Indium, Elastomer
Comments Decomposes when sputtered. Reactive preferred.

Available Sizes of Boron Nitride Sputtering Target

Material Size
Boron Nitride, BN 3.00″ Dia. x 0.125″ Thick
Boron Nitride, BN 3.00″ Dia. x 0.250″ Thick
Boron Nitride, BN 4.00″ Dia. x 0.125″ Thick
Boron Nitride, BN 4.00″ Dia. x 0.250″ Thick
Boron Nitride, BN 6.00″ Dia. x 0.125″ Thick
Boron Nitride, BN 6.00″ Dia. x 0.250″ Thick
Boron Nitride, BN 8.00″ Dia. x 0.125″ Thick
Boron Nitride, BN 8.00″ Dia. x 0.250″ Thick

We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.

Description of Boron Nitride Sputtering Target

BoronBoron is a chemical element originated from the Arabic ‘buraq’, which was the name for borax. It was first mentioned in 1808 and observed by L. Gay-Lussac and L.J. Thénard. The isolation was later accomplished and announced by H. Davy. “B” is the canonical chemical symbol of boron. Its atomic number in the periodic table of elements is 5 with location at Period 2 and Group 13, belonging to the p-block. The relative atomic mass of boron is 10.811(7) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Boron Sputtering Target

NitrogenNitrogen is a chemical element originated from the Greek ‘nitron’ and ‘genes’ meaning nitre-forming. It was first mentioned in 1772 and observed by D. Rutherford. The isolation was later accomplished and announced by D. Rutherford. “N” is the canonical chemical symbol of nitrogen. Its atomic number in the periodic table of elements is 7 with location at Period 2 and Group 15, belonging to the p-block. The relative atomic mass of nitrogen is 14.0067(2) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Nitride Ceramic Sputtering Target

Packaging

Our boron nitride sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Get Contact

SAM’s boron nitride sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.

 

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Boron Nitride (BN) Sputtering Target
Average rating:  
 1 reviews
by Joey ONeil on Boron Nitride (BN) Sputtering Target
Excelente HBN worked well in my application.

Great stuff wish I found out about this stuff years ago.