1. Introduction to Sputtering Targets Sputtering targets are significant commodities for thin-film industries like electronics, optics, and energy sectors. Simply put, a “sputtering target” is the target material utilized for sputtering, a form of physical vapor deposition (PVD). During the PVD process, atoms from a solid target are removed and ejected upon impact by high-energy...Continue Reading
Titanium is a widely used material in thin film technology due to its high strength, corrosion resistance, and compatibility with a broad range of substrates. In sputtering, titanium targets are applied to deposit thin metallic films directly, or to form compound films such as titanium nitride (TiN) and titanium dioxide (TiO₂). These coatings are valued...Continue Reading
Introduction One of SAM’s long-term clients—a major display panel manufacturer—was experiencing frequent production disruptions. The culprit: cracking and uneven wear in their ITO sputtering targets, used in the thin-film deposition process for smartphone and tablet displays. After reviewing the setup, SAM proposed switching to denser, more uniform ITO targets. That small change led to significant...Continue Reading
1. Introduction Refractory metals like tantalum (Ta) and niobium (Nb) play an increasingly important role in thin film technology, particularly for environments that demand both high-temperature stability and corrosion resistance. These two elements, known for their exceptionally high melting points and strong chemical inertness, have found widespread use in advanced protective coatings. As industries such...Continue Reading
Introduction Crucibles are widely used in metallurgy, chemical processing, and a variety of industries. Among these crucibles, graphite crucibles are useful for the smelting of non-ferrous metals and alloys with their desirable properties. Let’s have a detailed discussion about the features, competitiveness, and uses of graphite crucibles. Hope that you can have a better understanding...Continue Reading
1. Introduction to PVD and CVD Physical vapor deposition (PVD) and chemical vapor deposition (CVD) are two essential thin-film deposition techniques widely used in semiconductors, tooling, optics, and clean energy. PVD relies on physical transformation (solid to vapor to solid), while CVD creates coatings through chemical reactions on the substrate surface. 2. Technical Comparison Table...Continue Reading
I. Introduction High-entropy alloys (HEAs) represent a paradigm shift in alloy design. Unlike traditional alloys that rely on a dominant elemental component, HEAs are composed of five or more principal elements in near-equiatomic or equimolar ratios. This unique composition results in high-entropy solid solutions with superior properties not achievable by conventional alloys. The concept of...Continue Reading
Introduction Background of Sputtering Technology Thin film deposition is a cornerstone in the fabrication of modern technological devices. From electronic components to optical coatings, the demand for high-quality thin films has surged, driving advancements in deposition techniques. Among these, sputtering has emerged as a versatile and reliable method, offering precise control over film composition and...Continue Reading
Since ancient times, gold has been revered as a highly valuable material. From making jewelry to cookware and industrial materials, gold has proven to be very useful and precious to man, particularly because of its high malleability, ductility, and lustrous nature. Gold is one of the most precious metals known to man, and it has...Continue Reading
