(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0917 Stainless Steel Sputtering Target

Chemical Formula Fe/Cr/Ni
Catalog No. ST0917
CAS Number 65997-19-5
Purity 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape Discs, Plates, Column Targets, Step Targets, Custom-made

The Stainless Steel Sputtering Target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers Stainless Steel Sputtering Targets renowned for exceptional quality, all at highly competitive prices.


Stainless Steel Sputtering Target Description

Stainless Steel Sputtering Target is a specialized material used in the sputter deposition process, a technique commonly employed in the production of thin films for various applications in industries such as electronics, optics, and coatings.

Stainless steel is a type of alloy that contains iron, chromium, nickel, and other elements. The specific composition of stainless steel can vary depending on the grade and intended application. In the context of sputtering targets, the stainless steel used is typically high-purity and designed for use in thin-film deposition processes.

The sputtering process involves bombarding a target material—in this case, stainless steel—with high-energy ions in a vacuum chamber. This bombardment causes atoms or particles from the target material to be ejected. These ejected particles then deposit onto a substrate, forming a thin film with the same composition as the target material.

Related Product: Chromium Sputtering Target

Stainless Steel Sputtering Target Specifications

Compound Formula Fe/Cr/Ni
Molecular Weight
Appearance Metallic Target
Melting Point
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

Thick: 0.125″, 0.250″

Stainless Steel Sputtering Target Handling Notes

  1. Indium bonding is recommended for Stainless Steel Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity and is susceptible to thermal shock.

Stainless Steel Sputtering Target Application

The use of a Stainless Steel Sputtering Target allows for precise control over the deposition process, enabling the creation of thin films with specific properties tailored to the requirements of different applications.

Stainless Steel Sputtering Target Packaging

Our Stainless Steel Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

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SAM’s Stainless Steel Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

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