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Molybdenum Target Shapes

Molybdenum Targets: Classification by Shapes and Applications

In thin film technology, materials need more than just potential—they need consistency, resilience, and performance...

Choosing Powder Metallurgy for High-Performance Sputtering Targets

1. Introduction Sputtering targets play a central role in physical vapor deposition (PVD) processes, forming...
Inner linings for components in acid processing

Tantalum and Niobium Targets for High-Temperature Corrosion-Resistant Films

1. Introduction Refractory metals like tantalum (Ta) and niobium (Nb) play an increasingly important role...

Graphite Crucibles Used for Metal Smelting

Introduction Crucibles are widely used in metallurgy, chemical processing, and a variety of industries. Among...
Tantalum Capacitors

The Key Role of Tantalum Targets in Semiconductor Manufacturing

When we think about semiconductor manufacturing, we often picture highly advanced technologies, intricate processes, and...
Ti alloy targets

Metal, Ceramic, or Alloy: Choosing the Right Sputtering Target

When it comes to thin film deposition, the choice of sputtering target material can make...

Rotary Metal Targets in Semiconductor Sputtering

Ever wondered what makes semiconductor devices work like magic? Well, the answer lies in the...
thin film coating

CVD Growth of Multilayer hBN Films on Copper Foils

Introduction Hexagonal boron nitride (hBN) is an extremely hot research area within materials and nanotechnology. It...
3 Factors Affecting the Deposition Rate in Magnetron Sputtering

3 Factors Affecting the Deposition Rate in Magnetron Sputtering

Magnetron sputtering is a physical vapor deposition method that allows the deposition of various materials,...
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