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1. Introduction to Sputtering Targets Sputtering targets are significant commodities for thin-film industries like electronics, optics, and energy sectors. Simply put, a “sputtering target” is the target material utilized for sputtering, a form of physical vapor deposition (PVD). During the PVD process, atoms from a solid target are removed and ejected upon impact by high-energy...Continue Reading

Titanium is a widely used material in thin film technology due to its high strength, corrosion resistance, and compatibility with a broad range of substrates. In sputtering, titanium targets are applied to deposit thin metallic films directly, or to form compound films such as titanium nitride (TiN) and titanium dioxide (TiO₂). These coatings are valued...Continue Reading

Introduction Thin film deposition is an integral part of semiconductor chip production. Sputtering is perhaps the most established and reliable method of placing smooth films on wafers. Among all the materials that have been employed as targets, niobium stands out for its unique combination of electrical, thermal, and chemical properties that qualify it perfectly for...Continue Reading