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optimize-target-tco

Semiconductor Target TCO Analysis: Boosting Utilization by 30% via Design & Bonding

Abstract: In semiconductor manufacturing, the cost of a PVD sputtering target extends far beyond its purchase...
3D-NAND-COVER

PVD Targets for DRAM & 3D NAND Manufacturing: From Capacitor Electrodes to Step Coverage

Abstract: The divergence in memory architecture between DRAM and 3D NAND Flash presents unique thin-film...
3nm 2nm chips

Key PVD Target Guide for 3nm/2nm Nodes: Selecting Cobalt & Ruthenium Barrier Layers

As the semiconductor industry advances beyond the 5nm node, conventional barrier/liner materials, such as Ta/TaN,...
Maximizing PEM Electrolyzer Performance with Advanced PVD Coatings

Maximizing PEM Electrolyzer Performance with Advanced PVD Coatings

Introduction Hydrogen is widely viewed as a promising source of green energy because when it...

Revolutionizing Heat Storage with Stripe-Type-Lambda-Trititanium-Pentoxide

Introduction In recent advancements within material science, researchers at the University of Tokyo have made...

PVD Coatings for Wear and Corrosion Resistance

In the realm of material science and engineering, the pursuit of enhanced durability and longevity...
What Are the Most Important Characteristics of Target Selection?

What Are the Most Important Characteristics of Sputtering Target Selection

1.   Introduction to Sputtering Target Selection The target quality is rather significant for the coating...
An Introduction to Powder Metallurgy

An Introduction to Powder Metallurgy

Powder metallurgy is an important metal-forming procedure used in manufacturing essential materials like cutting tools,...
An Introduction to Metal Casting Process

An Introduction to Metal Casting Process

Metal casting is an industrial manufacturing process that is more than 5,000 years old. To...
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