The titanium sputtering target and the aluminum sputtering target are both the sputtering materials for film coating. The titanium film is a strong, lightweight coating material that is used in many film coating applications. However, because of the price, it is often compared to aluminum film, which is also a very strong film material but...Continue Reading
The crucible is an important vessel for scientific experiments as well as industrial productions. It is a pot that is used to keep metals for melting in a furnace. So furnace crucibles are usually designed to withstand the highest temperatures encountered in the metal casting works, which means the crucible should essentially be made of...Continue Reading
Copper sputtering target is an excellent sputtering material in the vacuum coating industry. Sputtering targets are a special group of materials, especially for thin film coating, and the copper sputter target is a product of high purity copper metal after a series of processes. It has specific dimensions and shapes. Since high purity copper material has many excellent properties,...Continue Reading
Breast cancer is a common malignant tumor for women. Early diagnosis and treatment can significantly improve the survival rate of this cancer. It has been reported that the cure rate of early breast cancer is as high as 80% to 90%. Modern advanced molybdenum target X-ray machine photography has become the first choice for breast...Continue Reading
Titanium sputtering target and titanium shooting target only differ by one letter in the middle. Does this small change make a big difference? You can have a guess here, and you will find the answer at the end of this article. What is the titanium sputtering target? Sputtering target refers to the raw material used...Continue Reading
Why the titanium target price is high? Titanium target price is not cheap mainly due to the high price of its raw material titanium. Titanium sputtering target is mainly used for various film coatings, such as tool coating, optics coating, solar coating, and the like. However, its high price is a big obstacle for its...Continue Reading
An Overview of Magnetron Sputtering Magnetron sputtering, a physical vapor deposition (PVD) process, is a main thin film deposition method for manufacturing semiconductors, disk drives, CDs, and optical devices. Magnetron sputtering has the advantages of high speed, low temperature, and low damage. In this article, let’s take a look at the definition, working principle, and...Continue Reading
What are the Three Generations of Semiconductor Materials? The first generation of semiconductor material The first generation of semiconductor materials mainly refers to silicon (Si) and germanium (Ge) materials. In the 1950s, Ge dominated the semiconductor market and was mainly used in low-voltage, low-frequency, medium-power transistors and photodetectors. However, Ge semiconductor devices were inferior in...Continue Reading
The sputtering target refers to the sputtering source that is deposited on a substrate to form various functional films under appropriate process conditions. Sputtering targets are widely used in many fields such as decoration, tooling, glass, electronic devices, semiconductors, and solar cells. Sputtering targets required in different fields vary. They can be classified into pure...Continue Reading
