Blog | Stanford Advanced Materials

Stanford Advanced Materials (SAM) Corporation is a global supplier of various sputtering targets such as metals, alloys, oxides, ceramic materials. We update every week about news and knowledge of sputtering targets and evaporation materials. Here are the blogs we published previously.

December 19, 2023Blog, Sputtering Technology, Thin film Coating

Advancements in Indium Tin Oxide Nanotechnology

Introduction Indium Tin Oxide (ITO) has long been a stalwart in the realm of transparent conducting oxides, but recent strides in nanotechnology have ushered in a new era for this versatile material. This article looks at ITO nanotechnology, studying how making tiny structures is changing the way ITO works. This helps it do more things...

December 12, 2023Blog, CVD, Target Application

CVD Technology’s Impact on Semiconductor Thin Film Production

Introduction In the intricate landscape of semiconductor manufacturing, Chemical Vapor Deposition (CVD) technology plays a pivotal role in the creation of precise thin films. This exploration delves into the applications of CVD in the semiconductor industry, emphasizing its contribution to precision and addressing challenges specific to thin film production. Understanding CVD in Semiconductor Manufacturing Semiconductors,...

December 6, 2023Blog, PVD, Sputtering Technology, Target Application

Advanced Applications of PVD in Semiconductor Devices

Introduction In the rapidly advancing landscape of semiconductor technology, Physical Vapor Deposition (PVD) stands as a pivotal tool for achieving precision and efficiency in thin film deposition processes. This article is a comprehensive exploration of the advanced applications of PVD technology within the semiconductor industry, offering a detailed examination of its diverse applications, supported by...

November 28, 2023Blog, CVD, PVD, Sputtering Target, Sputtering Technology, Thin film Coating

Temperature Differences between PVD and CVD

Introduction Thin-film deposition techniques play a crucial role in various industries, providing protective coatings that enhance the properties of materials. Among these methods, Physical Vapor Deposition (PVD) and Chemical Vapor Deposition (CVD) stand out, each distinguished by their unique characteristics, including the temperature at which they operate. Temperature Difference in PVD Definition and Basic Principles PVD encompasses...

November 20, 2023Blog, Manufacturing Method, PVD

Emerging Trends in PVD Technology

Introduction Physical Vapor Deposition (PVD) technology is at the forefront of materials science, continually evolving to meet the demands of various industries. In this article, we undertake a comprehensive exploration of the evolving trends in PVD technology. From the latest innovations to potential applications across different industries, we delve into the intricate landscape of PVD....

November 1, 2023Blog, Evaporation Materials, Sputtering Technology, Thin film Coating

Thin Film Coating Technologies: Sputtering vs. Thermal Evaporation

Introduction Thin film coatings are a critical component of various industries, from microelectronics to optics. Two prominent techniques for depositing these thin films are sputtering and thermal evaporation. Let’s compare these two technologies to understand their strengths and applications. Sputtering: Precision and Versatility Sputtering is a physical vapor deposition (PVD) technique that involves the removal...

October 26, 2023Blog, Sputtering Target

AZO Sputtering Targets: Enabling High-Performance Optoelectronic Devices

Introduction In the realm of optoelectronics, the pursuit of high performance and precision is unceasing. Optoelectronic devices, which encompass everything from laser diodes to LED displays, rely on advanced materials to deliver the exceptional performance and reliability we expect. AZO sputtering targets, with their unique properties and versatility, have emerged as essential components in the...

October 19, 2023Blog, Target Application

Rotatable Sputtering Targets: Revolutionizing Thin Film Deposition

Introduction In the world of thin film deposition, where precision, consistency, and efficiency are paramount, the choice of sputtering targets plays a pivotal role in determining the quality and performance of the final product. Among the various types of sputtering targets available, rotatable sputtering targets have emerged as game-changers. These innovative targets offer distinct advantages...

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