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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

Blogs

Stanford Advanced Materials (SAM) Corporation is a global supplier of various sputtering targets such as metals, alloys, oxides, ceramic materials. We update every week about news and knowledge of sputtering targets and evaporation materials. Here are the blogs we published previously.

How to Determine the Maximum Power to Safely Use a Sputtering Target?

Introduction Sputtering is a common thin-film deposition technique used in various industries, including semiconductors, optics, and surface coatings. A sputtering target is a key component in the process, as it is responsible for generating the material to be deposited onto a substrate. It is important to ensure that the sputtering target is used at a...
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chromium-pellets-as-an-evaporation-material

Introduction and Properties of Chromium Pellets as An Evaporation Material

Introduction Chromium is a transition metal that is commonly used as an evaporation material for thin-film coatings. The use of chromium pellets as evaporation materials in thin-film coating is based on their high melting and boiling points, good thermal conductivity, and excellent adhesion to various substrates. This article introduces chromium pellets as an evaporation material...
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benefits-of-silicon-sputtering-targets

Remarkable Benefits of Silicon Sputtering Targets

Introduction Silicon sputtering targets are one of the cornerstones in the field of thin film deposition, offering huge advantages to industries such as semiconductors, solar panels, and advanced coatings. This article takes an in-depth look at the exceptional benefits and properties of silicon sputtering targets, revealing why they are ideal for achieving superior thin film...
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Palladium Sputtering Target, Pd

Benefits of Palladium Sputter Targets in Thin Film Deposition

Introduction Palladium (Pd) is a highly sought-after metal for thin film deposition due to its unique properties. One popular method for depositing Pd thin films is through the use of sputtering targets. In this article, we will explore the benefits of using palladium sputter targets for thin film deposition and their applications in various industries....
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Lab Equipment for Evaporation: Crucibles and Metal Liners

Introduction Evaporation is a typical process used in many laboratory applications such as thin film deposition, vacuum metallurgy, and semiconductor manufacturing. During evaporation, a material is heated until it evaporates and condenses onto a substrate. The choice of crucible and metal liners for this process is crucial to ensure optimal performance and yield. In this article,...
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What Is the Proper Fill Rate of An E-Beam Crucible Liner?

Introduction When it comes to electron beam (e-beam) evaporation, the proper fill rate of a material in an e-beam crucible liner is an important consideration to ensure a successful deposition process. In this article, we will discuss what the fill rate is, why it is significant, and how to determine the proper fill rate for...
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specification-of-gallium-arsenide-wafer

Specifications of Gallium Arsenide Wafers

Introduction Gallium Arsenide (GaAs) wafers are an essential component in the production of high-performance electronic devices, and they have specific specifications that must be met to ensure their effectiveness. In this article, we will discuss the key specifications of GaAs wafers so that you can have a further understanding of this useful material. What Are...
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Magnesium Oxide Target in the Production of Thin-Film Transistors

Thin-film transistors (TFTs) have become integral to a wide variety of electronic devices, including flat-panel displays, touch screens, and solar cells. TFT manufacturing processes are inextricably linked to magnesium oxide (MgO) targets, and this sputtering target for thin-film coating applications is increasingly being used to enhance TFTs’ performance. This article will explore the role of...
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