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How to Determine the Maximum Power to Safely Use a Sputtering Target?

Introduction Sputtering is a common thin-film deposition technique used in various industries, including semiconductors, optics,...
chromium-pellets-as-an-evaporation-material

Introduction and Properties of Chromium Pellets as An Evaporation Material

Introduction Chromium is a transition metal that is commonly used as an evaporation material for...
benefits-of-silicon-sputtering-targets

Remarkable Benefits of Silicon Sputtering Targets

Introduction Silicon sputtering targets are one of the cornerstones in the field of thin film...
Palladium Sputtering Target, Pd

Benefits of Palladium Sputter Targets in Thin Film Deposition

  Introduction Palladium (Pd) is a highly sought-after metal for thin film deposition due to...

Lab Equipment for Evaporation: Crucibles and Metal Liners

Introduction Evaporation is a typical process used in many laboratory applications such as thin film...

What Is the Proper Fill Rate of An E-Beam Crucible Liner?

Introduction When it comes to electron beam (e-beam) evaporation, the proper fill rate of a...
specification-of-gallium-arsenide-wafer

Specifications of Gallium Arsenide Wafers

Introduction Gallium Arsenide (GaAs) wafers are an essential component in the production of high-performance electronic...

Gallium Arsenide Wafer Used for Electronic Devices Manufacturing

Introduction Gallium Arsenide (GaAs) wafers have a variety of applications in the field of electronics,...

Practical Methods to Increase Deposition Rate

Introduction The deposition rate is an important factor in the field of thin film deposition,...
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