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3nm 2nm chips

Key PVD Target Guide for 3nm/2nm Nodes: Selecting Cobalt & Ruthenium Barrier Layers

As the semiconductor industry advances beyond the 5nm node, conventional barrier/liner materials, such as Ta/TaN,...

What is Chemical Vapor Deposition (CVD)? The Ultimate Guide

Introduction Chemical Vapor Deposition (CVD) might sound like an obscure lab technique, but it’s the...

Case Study: Ensuring Optimal Performance of IGZO Sputtering Targets through Expert Preconditioning Guidance

Client: A leading thin-film deposition research facility Challenge: Uncertainty in preconditioning and operating a non-conductive IGZO sputtering...
Advanced Production Techniques for Metal Alloy Sputtering Target Manufacturing

Advanced Production Techniques for Metal Alloy Sputtering Target Manufacturing

Introduction For many years, producing metal alloy sputtering targets has been a work of precision...

Hot Pressing: A Key Process in Ceramic Sputtering Target Fabrication

Introduction Ceramic sputtering targets require special handling. Unlike many metals that can be melted and...
Physical Characteristics of Hot-Pressed Ceramic Sputtering Targets

Physical Characteristics of Hot-Pressed Ceramic Sputtering Targets

Introduction When we work with ceramic sputtering targets, we often start with a basic powdered...
Maximizing PEM Electrolyzer Performance with Advanced PVD Coatings

Maximizing PEM Electrolyzer Performance with Advanced PVD Coatings

Introduction Hydrogen is widely viewed as a promising source of green energy because when it...
nb_sputtering_target

Everything You Need to Know About Niobium Sputtering Targets for High-Performance Applications

Introduction In the field of material science and thin-film deposition, many industries rely on precise...
Tantalum Sputtering Target

Everything You Need to Know About Tantalum Sputter Targets

Introduction Tantalum sputtering targets have been an important material in many industrial processes. They are...
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