Sputtering targets have important applications in many areas, such as architecture, optics, electronics and so on. Sputtering targets used in electronic industry can be subdivided into semiconductor target (also called anelva target), planar target, coated glass target, solar photovoltaic target, and so on. There are some differences in the selection and performance requirements of sputtering materials in different application fields....Continue Reading

Sputtering targets are a physical vapor deposition (PVD) mechanism with many uses in modern technology and manufacturing. In the sputtering process, the atoms are pulled from the sputter target with powerful magnets, and a controlled gas (usually argon) is introduced. Then, the processed to collide with each other in their gaseous state before condensing into...Continue Reading

Metal titanium and titanium sputtering target are essentially the same, both of which are composed of titanium element; the difference is that metal titanium is more like a raw material, and titanium target is more like a titanium product. Titanium as a raw material can be made into titanium sputtering targets by several methods, and...Continue Reading

The sputtering target is an important material for physical vapor deposition, the most widely used technology for depositing materials. As its name suggests, “physical” means that the PVD coating method involves a purely physical process. During the physical vapor deposition, a solid target material is broken up into the vapor state (usually in a high...Continue Reading

Magnetron sputtering is a physical vapor deposition method that allows the deposition of various materials, including metals, oxides, ceramics and etc. by using a specially formed magnetic field applied to a diode sputtering target. The deposition rate, or the film formation rate, is an important parameter that measures the effectiveness of the magnetron sputtering machine....Continue Reading

The yttrium oxide dielectric film refers to a thin film material as a dielectric, which is an important component and ideal material of a hybrid integrated circuit used in the electronics industry. Yttrium Oxide Dielectric Film Properties Y2O3 is a white powder with a crystal structure of body-centered cubic. Yttrium Oxide Dielectric Film has good...Continue Reading

Introduction Sputtering targets are essential materials used in the deposition of thin films through a process known as sputtering, a cornerstone technique in semiconductor manufacturing and surface coating technologies. Aluminum scandium sputtering targets, consisting of an aluminum alloy with scandium, represent a significant advancement in this field. The addition of scandium to aluminum not only...Continue Reading

The Semiconductor Market: Opportunities and Threats From both of the perspective of technology or economic development, the importance of semiconductors is enormous. Most of today’s electronic products, such as computers, mobile phones or digital recorders, have a very close relationship with semiconductors. Along with the rapid development, the semiconductor market also faces some challenges. First,...Continue Reading

Gold Sputter Target Demand Increases As LED Market Grows The LED industry has grown rapidly over the past decade partially due to the penetration of LED-backlit TVs and laptops. One of the most important functional components of the LED is the LED semiconductor chip. At present, the materials used in the manufacturing of LED chips are...Continue Reading