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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0215 Silicon Nitride (Si3N4) Sputtering Target

Chemical Formula: Si3N4
Catalog Number: ST0215
CAS Number: 12033-89-5
Purity: 99.5%, 99.9%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Silicon Nitride Safety Data Sheet

 




Description

Description

SiliconNitrogenSilicon Nitride is a high-melting-point ceramic material that is extremely hard and relatively chemically inert. The material is prepared by heating powdered silicon between 1300 °C and 1400 °C in an atmosphere of nitrogen. Then the powder of silicon nitride can be sintered to the designed shape.

Related Product: Nitride Ceramic Sputtering Target

Specifications

Material Type Silicon Nitride
Symbol Si3N4
Color/Appearance White to Gray or Dark Gray to Black, Crystalline Solid
Melting Point 1,900 °C
Density 2.2 to 3.5 g/cm3
Sputter RF, RF-R
Type of Bond Indium, Elastomer
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

Applications

As it is one of the most thermodynamically stable technical ceramic material with high hardness as well, silicon nitride ceramic is ideal for bearing parts, especially for those required to work at high speed and high temperature. Si3N4 bearing balls have already been applied in automobiles, rockets high-speed engines, equipment working in a corrosive environment and some performance model cars. Compared with steel, high-performance ceramic balls have better mechanical properties under high temperature and could survive from most of the corrosive chemicals. Silicon nitride has also been used in high-temperature applications, such as rocket engines. It was considered as one of the few monolithic ceramic materials that could survive the severe thermal shock and thermal gradients generated in hydrogen-oxygen rocket engines. Silicon nitride sputtering targets can be used in thin film deposition.

Target Bonding Services

Indium bonding and Elastomer bonding are available for the silicon nitride sputtering targets. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.Target Bonding Services

Packing

Our silicon nitride sputter targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Get Contact

Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.

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Silicon Nitride (Si3N4) Sputtering Target
Average rating:  
 2 reviews
by Eric Garcetti on Silicon Nitride (Si3N4) Sputtering Target

These Si3N4 targets are really nice. They're made from very good raw materials. They are really well-made.

by John Ricci on Silicon Nitride (Si3N4) Sputtering Target

These target sizes are well-tailored and perfectly fit my coater.