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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0215 Silicon Nitride Sputtering Target, Si3N4

Chemical Formula: Si3N4
Catalog Number: ST0215
CAS Number: 12033-89-5
Purity: 99.5%, 99.9%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Silicon nitride sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high quality silicon nitride sputter target at the most competitive price.

Silicon Nitride Sputtering Target Safety Data Sheet

 




Description

Silicon Nitride Sputtering Target Description

NitrogenSiliconSilicon nitride sputtering target is a type of nitride ceramic sputtering target. Si3N4 is a high-melting-point ceramic material that is extremely hard and relatively chemically inert. Si3N4 is prepared by heating powdered silicon between 1300 °C and 1400 °C in an atmosphere of nitrogen. Then the powder of silicon nitride can be sintered to the designed shape. Silicon nitride sputter target is used for thin film deposition.

Silicon Nitride Sputtering Target Specifications

Material Type Silicon Nitride
Symbol Si3N4
Color/Appearance White to Gray or Dark Gray to Black, Crystalline Solid
Melting Point 1,900 °C
Density 2.2 to 3.5 g/cm3
Sputter RF, RF-R
Type of Bond Indium, Elastomer
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.

Silicon Nitride Sputtering Target Applications

Silicon nitride sputtering targets are used for CD-ROM, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Silicon nitride is one of the most thermodynamically stable technical ceramic material with high hardness as well, silicon nitride ceramic is ideal for bearing parts, especially for those required to work at high speed and high temperature. Silicon nitride has also been used in high-temperature applications, such as rocket engines. It was considered as one of the few monolithic ceramic materials that could survive the severe thermal shock and thermal gradients generated in hydrogen-oxygen rocket engines.

Silicon Nitride Sputtering Target Bonding Services

Indium bonding and Elastomer bonding are available for the silicon nitride sputtering materials. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.Target Bonding Services

Silicon Nitride Sputtering Target Packing

Our silicon nitride sputter targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Get Contact

High Quality silicon nitride sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.

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Silicon Nitride (Si3N4) Sputtering Target
Average rating:  
 2 reviews
by Eric Garcetti on Silicon Nitride (Si3N4) Sputtering Target

These Si3N4 targets are really nice. They're made from very good raw materials. They are really well-made.

by John Ricci on Silicon Nitride (Si3N4) Sputtering Target

These target sizes are well-tailored and perfectly fit my coater.