Chemical Formula:Si3N4
Catalog Number:ST0215
CAS Number:12033-89-5
Purity:99.5%, 99.9%
Shape:Discs, Plates, Column Targets, Step Targets, Custom-made
Indium bonding and Elastomer bonding are available for the silicon nitride sputtering targets. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.
| Material Type | Silicon Nitride |
| Symbol | Si3N4 |
| Color/Appearance | White to Gray or Dark Gray to Black, Crystalline Solid |
| Melting Point | 1,900 °C |
| Density | 2.2 to 3.5 g/cm3 |
| Sputter | RF, RF-R |
| Type of Bond | Indium, Elastomer |
Nitrogen is a chemical element originated from the Greek ‘nitron’ and ‘genes’ meaning nitre-forming. It was first mentioned in 1772 and observed by D. Rutherford. The isolation was later accomplished and announced by D. Rutherford. “N” is the canonical chemical symbol of nitrogen. Its atomic number in the periodic table of elements is 7 with location at Period 2 and Group 15, belonging to the p-block. The relative atomic mass of nitrogen is 14.0067(2) Dalton, the number in the brackets indicating the uncertainty.
Silicon is a chemical element originated from the Latin ‘silex’ or ‘silicis’, meaning flint. It was first mentioned in 1824 and observed by J. Berzelius. The isolation was later accomplished and announced by J. Berzelius. “Si” is the canonical chemical symbol of silicon. Its atomic number in the periodic table of elements is 14 with location at Period 3 and Group 14, belonging to the p-block. The relative atomic mass of silicon is 28.0855(3) Dalton, the number in the brackets indicating the uncertainty.
Our silicon nitride sputtering targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
SAM’s silicon nitride sputter targets are available in various forms, purities, and sizes. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.
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These Si3N4 targets are really nice. They're made from very good raw materials. They are really well-made.
These target sizes are well-tailored and perfectly fit my coater.
