Chemical Formula: Si3N4
Catalog Number: ST0215
CAS Number: 12033-89-5
Purity: 99.5%, 99.9%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Silicon nitride sputtering targets are available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality silicon nitride sputter targets at the most competitive price.
Silicon Nitride Sputtering Target Safety Data Sheet
High-Purity Silicon Nitride for Advanced Thin Film Applications
Silicon nitride sputtering target is a high-performance nitride ceramic sputtering target widely used in thin film deposition processes. Composed of Si₃N₄, the material possesses high melting point, excellent hardness, and excellent chemical inertness, which makes it highly suitable for extreme coatings.
Synthesized by the heat treatment of silicon powder at high temperatures (in the range of 1300°C to 1400°C) in a nitrogen atmosphere, silicon nitride powder is sintered into precise shapes to make the sputtering targets. The targets are constructed to deliver uniform and high-quality thin films in physical vapor deposition (PVD) systems, such as in sputtering.
Key Features
High melting point and thermal stability
Superior hardness and wear resistance
Good chemical inertness and corrosion resistance
Precision sintered shapes for consistent sputtering performance
| Material Type | Silicon Nitride |
| Symbol | Si3N4 |
| Color/Appearance | White to Gray or Dark Gray to Black, Crystalline Solid |
| Melting Point | 1,900 °C |
| Density | 2.2 to 3.5 g/cm3 |
| Sputter | RF, RF-R |
| Type of Bond | Indium, Elastomer |
| Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ |
We also offer other customized shapes and sizes of the sputtering targets. Please send us an inquiry for more information.
Silicon Nitride Sputtering Target Ordering Options
| Material | Size | Purity |
|---|---|---|
| Silicon Nitride | 1″ Dia. x 0.125″ Thick | 99.5% / 99.9% |
| Silicon Nitride | 1″ Dia. x 0.250″ Thick | 99.5% / 99.9% |
| Silicon Nitride | 2″ Dia. x 0.125″ Thick | 99.5% / 99.9% |
| Silicon Nitride | 2″ Dia. x 0.250″ Thick | 99.5% / 99.9% |
| Silicon Nitride | 3″ Dia. x 0.125″ Thick | 99.5% / 99.9% |
| Silicon Nitride | 3″ Dia. x 0.250″ Thick | 99.5% / 99.9% |
| Silicon Nitride | 4″ Dia. x 0.125″ Thick | 99.9% |
| Silicon Nitride | 4″ Dia. x 0.250″ Thick | 99.9% |
Silicon nitride (Si₃N₄) sputtering targets are used in:
Optical and Information Storage:
Used in the production of CD-ROMs and other optical information storage media, where durable and precise thin films are essential.
Semiconductor and Display Technologies:
Applied in semiconductor devices, flat panel displays, LEDs, and photovoltaic cells to create functional coatings with enhanced performance and durability.
Glass Coating Industry:
Employed for coating automotive and architectural glass, improving durability, scratch resistance, and optical clarity.
Optical Communication:
Utilized in components requiring high-quality thin films with excellent stability and optical properties.
Beyond thin film applications, silicon nitride’s exceptional hardness and thermodynamic stability make it ideal for demanding mechanical uses:
High-Speed Bearing Parts:
Silicon nitride ceramics are preferred for bearings operating under high speed and high temperature due to their wear resistance and mechanical strength.
High-Temperature Applications:
Used most significantly in the aerospace sector, silicon nitride endures extreme thermal gradients and shock, such as for hydrogen-oxygen rocket engines, and is among the only monolithic ceramics that may be subjected to such harsh environments.
Silicon nitride sputtering materials are commonly available with indium bonding and elastomer bonding options. Copper bonding is also widely used and can be customized based on customer requirements. Stanford Advanced Materials specializes in machining standard backing plates and collaborates with Taiwan Bonding Company to provide comprehensive bonding services. For inquiries about target bonding materials, methods, and services, please click here.
Our silicon nitride targets are externally labeled and marked for proper identification and quality assurance. They are vacuum-sealed to prevent moisture absorption and are carefully handled to prevent damage during shipping and storage.
High-quality silicon nitride sputtering targets are available in various forms, purities, sizes, and prices.We are experts at manufacturing high purity thin film deposition materials with the highest density that is possible and smallest average grain size that is possible for semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optics markets. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.
Q1: In what way do purity levels affect silicon nitride sputtering target performance?
Higher purity targets reduce contamination and improve film uniformity, leading to greater device reliability.
Q2: Can silicon nitride sputtering targets be customized?
Yes, sizes, purity levels, and bonding types can be tailored to meet specific application requirements.
Q3: What type of packaging ensures the long-term quality of silicon nitride targets?
Sealed packaging or vacuum protects against moisture and mechanical damage during storage and transport.
Submit your review | |
These Si3N4 targets are really nice. They're made from very good raw materials. They are really well-made.
These target sizes are well-tailored and perfectly fit my coater.
