Chemical Formula: Zn
Catalog Number: ST0058
CAS Number: 7440-66-6
Purity: 99.9%, 99.95%, 99.99%, 99.995%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Stanford Advanced Materials (SAM) provides the highest quality Zinc sputtering target on the market. We manufacture products according to your specifications.
Zinc sputtering target shares properties with its source material. Zinc is a chemical element originated from the German, ‘zinc’, which may in turn be derived from the Persian word ‘sing’, meaning stone. It was early used before 1000 BC and discovered by Indian metallurgists. “Zn” is the canonical chemical symbol of zinc. Its atomic number in the periodic table of elements is 30 with location at Period 4 and Group 12, belonging to the d-block. The relative atomic mass of zinc is 65.409(4) Dalton, the number in the brackets indicating the uncertainty.
|Density||7.14 g/cm (near r.t.)|
|Thermal Conductivity||116 W/m.K|
|Melting Point||419.53 °C|
|Boiling Point||907 °C|
|Coefficient of Thermal Expansion||30.2 x 10-6/K|
|Type of Bond||Indium, Elastomer|
Zinc sputtering materials are used for thin-film coating applications, CD-ROM, decoration, flat panel displays, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Elastomeric Target Bonding Service is available for pure metal Zn Zinc Sputtering Target. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.
Our high purity zinc sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
Zinc sputtering targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film deposition materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.
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