(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

Category

Sputtering Target
Ultra low radiation coated glass building
Ultra low radiation silver-coated glass production process Low-emission coated glass has now been widely accepted by the public that this kind of glass is widely used in automobiles, doors and windows, and glass curtain walls. The core functional layer for low-emission coated glass is a silver film or silver-doped alloy film layer, which bears the...
Continue Reading
sputtering-target-purity
Effect of Sputtering Target Purity on Large-Area Coating Production The requirement of the target quality for sputter coating is higher than that of the traditional materials industry. When the substrate enters the high vacuum coating chamber, if the sputtering target is not pure enough, under the action of the electric field and the magnetic field,...
Continue Reading
dual-co-rf-magnetron-sputtering4
Scandium nitride (ScN) is a metal nitride semiconductor. The crystal structure of ScN is generally rock salt and non-polar. However, the first principle calculation indicates that ScN may also have a wurtzite structure and can be made into Sc-IIIA-Nitride. The IIIA nitride refers to AlN, GaN, and InN, and the structure of the nitride is...
Continue Reading
Recent Studies on Titanium Dioxide Film
Titanium dioxide (TiO2) is a hard and chemically resistant oxide of titanium. Using TiO2 sputtering target can obtain good quality titanium dioxide films, which have been widely used in various applications due to their multiple interesting properties. The first half of this passage introduces some of the properties and applications of titanium oxide film, and the latter...
Continue Reading
all-types-of-sputtering-target
Sputtering is a method of physical vapor deposition (PVD) technologies and is one of the main techniques for preparing electronic thin film materials. It utilizes the ions generated by the ion source to accelerate the aggregation in a high vacuum to form an ion beam with high speed and high energy. The ion beam bombards...
Continue Reading
5 Points For Sputtering Target Maintenance
Sputtering Target Maintenance In order to avoid short circuit and arc initiation caused by the unclean cavity in the sputtering process, it is necessary to remove the accumulated sputtering materials deposited in the middle and on both sides of the sputtering track in stages. It is also helpful for users to continuously sputtering with the...
Continue Reading
Elements used in one phone
Metal elements have many applications in mobile phones. And today we tend to mention two important ones–molybdenum and titanium. The main use of tantalum materials in electronic products comes in the creation of the tantalum capacitor; and the main use of molybdenum in mobile phones mainly related to the liquid crystal display coating: using magnetron...
Continue Reading
An Overview of Aluminum Sputtering Target
You may be familiar with aluminum but unfamiliar with aluminum sputter targets. But to some extent, they are the same, consisting of atom Al. In a word, the aluminum sputtering target can be considered a product after a series of processes from high-purity aluminum. Aluminum target is a type of sputtering material used mounted on a vacuum...
Continue Reading
2018 MRS Fall Meeting
As a global advanced materials supplier, Stanford Advanced Materials (SAM) is pleased to announce that we will participate in the 2018 MRS Fall Exhibit, where over 240 international exhibitors from all sectors of the global materials science and engineering communities will display a full spectrum of equipment, instrumentation, products, software, publications, and services. The exhibition...
Continue Reading
1 6 7 8 9 10 12