It is known to us that by applying different sputtering targets, we can obtain solar transparent electrodes of different kinds and characteristics can be obtained. However, not all targets can be applied to solar cells. The following is a summary of three main sputtering targets used in the solar industry. ITO targets Indium tin oxide...Continue Reading

Definition of ITO Sputtering Target The full name of ITO is indium tin oxide, a composition of indium, tin, and oxygen with different proportions. The substance of ITO and ITO sputtering target is the same, the latter of which is actually a black-gray ceramic semiconductor formed by mixing indium oxide and tin oxide powder in...Continue Reading

Requirements of Titanium Sputtering Target Titanium sputtering target is widely used in high-tech fields, such as electronics, information industry, home decoration, automobile glass manufacturing, etc. In these industries, titanium target is mainly used for coating the surface of components, such as integrated circuits, flat panel displays, or as a decorative coating, glass coating, etc. Different industries...Continue Reading

Tungsten crucibles are essential tools in both scientific research and industrial applications, prized for their remarkable resistance to high temperatures and corrosive environments. Crafted from tungsten, one of the metals with the highest melting point, these crucibles are uniquely suited to processes requiring extreme conditions, such as metal smelting and chemical experiments. Their ability to...Continue Reading

Aluminum titanium alloy Aluminum titanium alloy is a kind of metal material with high die-casting yield, high density, high strength and flexibility. The difference between aluminum titanium alloy and titanium aluminum alloy is the proportion of these two elements. The element appears earlier has a larger proportion. Aluminum titanium alloy usually contains 0.50 to 1.20%...Continue Reading

Development of Semiconductor Materials 1 The first generation of semiconductor: represented by Si, Ge semiconductor materials; 2 The second generation of semiconductor: represented by GaAs, InP semiconductor materials; 3 The third generation of semiconductor: represented by several wide-bandgap semiconductor materials such as silicon carbide (SiC), gallium nitride (GaN), zinc oxide (ZnO), diamond, and aluminum nitride...Continue Reading

Previously, we have introduced Four main molding methods for ITO targets, mainly about their definitions and characteristics. And today I think it necessary to talk about the advantages and disadvantages of each method, which is helpful for you to make choices between them when you want to prepare ITO targets. Hot Pressing The hot pressing...Continue Reading

How to use ZnO or Zn powder to make a large diameter sputtering target? If you want to make a sputtering target by using ZnO or Zn powder, you have to know the following points. How to make a sputtering target? There are two main ways to make a sputtering target. One is casting. The...Continue Reading

Well, the question “what is the sputtering target” may seem stupid for insiders. But undoubtedly it is the most basic question in the relevant industry. Search this question in Google, you may find 3,770,000 results, which is quite a HUGE number! Just compare it with 4,510,000 results of searching “sputtering target”. (data may differ) So...Continue Reading