Introduction Sputtering is a cornerstone of physical vapor deposition (PVD) and stands at the forefront of materials science and advanced manufacturing. This versatile technique plays a pivotal role in the deposition of thin films onto substrates with plenty of advantages and limitations. In this article, we will delve into the world of sputtering, uncovering its...Continue Reading

Introduction Sputtering is a common thin-film deposition technique used in various industries, including semiconductors, optics, and surface coatings. A sputtering target is a key component in the process, as it is responsible for generating the material to be deposited onto a substrate. It is important to ensure that the sputtering target is used at a...Continue Reading

Introduction The deposition rate is an important factor in the field of thin film deposition, as it directly affects the production efficiency and throughput of the process. In this article, we will discuss practical methods to increase the deposition rate for various deposition techniques. Hope that you can have a better understanding of the factors...Continue Reading

Introduction Purity is one of the prime performance requirements of target selection, which has been explained in our previous article. It takes countless money, time, and labor every year to separate impurities. However, do impurities always have a negative influence on sputtering? We are going to explore this question in this article with specific cases....Continue Reading

The foundation of plasma technology is a basic physical principle. When energy is applied to matter, solids become liquids, and liquids turn into gases. If yet more energy is applied, the gas is ionized and it enters the energy-rich plasma state, the fourth state of matter. Plasma is a word used to describe matter that...Continue Reading

What is PVD Coating? Physical vapor deposition (PVD) coating refers to various coating techniques in which thin layers are created on a substrate using physical techniques. Each technology has a unique set of benefits. PVD coating starts by depositing films with precise stoichiometries to achieve color PVD finishes (ratio of certain elements). Typically, a base...Continue Reading

Physical Vapor Deposition (PVD) is a thin-film coating technique that physically converts a solid or liquid source of material into gaseous atoms, molecules, or ions under vacuum, which are then deposited on the surface of a substrate to form a thin film. The PVD-coated film has the advantages of fast deposition speed, strong adhesion, good diffraction performance,...Continue Reading

If you’ve ever heard of thin film coatings, then you might know about Sputtering! This involves materials being ejected from a source called a “target” onto a “substrate” like a silicon wafer. By injecting a reactive gas (usually oxygen or nitrogen) into the plasma, which is normally created by an inert gas like argon (the...Continue Reading

What is Pulsed Laser Deposition (PLD)? Pulse laser deposition is a method of physical vapor deposition. In this process, a high-power pulsed laser beam is centered on a target within the vacuum chamber. The laser beam vaporizes the target material and deposits it as a thin film on a substrate. The process involves evaporation, ablation,...Continue Reading