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(949) 407-8904 Mon - Fri 09:00 - 18:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 09:00 - 18:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0270 Zirconium Silicide (ZrSi2) Sputtering Target

Chemical Formula: ZrSi2
Catalog Number: ST0270
CAS Number: 12039-90-6
Purity: 99.9%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made




Description

Specification of Zirconium Silicide Sputtering Target

Compound Formula ZrSi2
Molecular Weight 147.4
Appearance Gray Target
Density 4.88 g/cm3

Chemical Elements of Zirconium Silicide Sputtering Target

SiliconSilicon is a chemical element originated from the Latin ‘silex’ or ‘silicis’, meaning flint. It was first mentioned in 1824 and observed by J. Berzelius. The isolation was later accomplished and announced by J. Berzelius. “Si” is the canonical chemical symbol of silicon. Its atomic number in the periodic table of elements is 14 with location at Period 3 and Group 14, belonging to the p-block. The relative atomic mass of silicon is 28.0855(3) Dalton, the number in the brackets indicating the uncertainty.

ZirconiumZirconium is a chemical element originated from the Persian ‘zargun’, meaning gold coloured. It was first mentioned in 1789 and observed by H. Klaproth. The isolation was later accomplished and announced by J. Berzelius. “Zr” is the canonical chemical symbol of zirconium. Its atomic number in the periodic table of elements is 40 with location at Period 5 and Group 4, belonging to the d-block. The relative atomic mass of zirconium is 91.224(2) Dalton, the number in the brackets indicating the uncertainty.

Packaging

SAM’s zirconium silicide sputtering targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Our products are carefully packaged in the plastic vacuum bag to prevent damage during storage and transportation and to preserve the quality of our products in their original condition. Also, the COA of the raw material would be packaged with the product.

Get Contact

SAM specializes in producing high purity zirconium silicide sputtering target with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.

 

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Zirconium Silicide (ZrSi2) Sputtering Target
Average rating:  
 1 reviews
by Thomas Brown on Zirconium Silicide (ZrSi2) Sputtering Target

Five Stars. Great product for the price! Easy to use.