ST0270 Zirconium Silicide (ZrSi2) Sputtering Target

Specification of Zirconium Silicide Sputtering Target

Chemical Elements of Zirconium Silicide Sputtering Target

Silicon is a chemical element originated from the Latin ‘silex’ or ‘silicis’, meaning flint. It was first mentioned in 1824 and observed by J. Berzelius. The isolation was later accomplished and announced by J. Berzelius. “Si” is the canonical chemical symbol of silicon. Its atomic number in the periodic table of elements is 14 with location at Period 3 and Group 14, belonging to the p-block. The relative atomic mass of silicon is 28.0855(3) Dalton, the number in the brackets indicating the uncertainty.

Zirconium is a chemical element originated from the Persian ‘zargun’, meaning gold coloured. It was first mentioned in 1789 and observed by H. Klaproth. The isolation was later accomplished and announced by J. Berzelius. “Zr” is the canonical chemical symbol of zirconium. Its atomic number in the periodic table of elements is 40 with location at Period 5 and Group 4, belonging to the d-block. The relative atomic mass of zirconium is 91.224(2) Dalton, the number in the brackets indicating the uncertainty.

Packaging

SAM’s zirconium silicide sputtering targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Our products are carefully packaged in the plastic vacuum bag to prevent damage during storage and transportation and to preserve the quality of our products in their original condition. Also, the COA of the raw material would be packaged with the product.

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SAM specializes in producing high purity zirconium silicide sputtering target with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.