Chemical Formula: Ti
Catalog Number: ST0053
CAS Number: 7440-32-6
Purity: 99.2%-99.7%, 99.97%-99.98%, >99.99%, 99.995%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Our planar titanium sputtering targets have high purity & density and uniform microstructure that can be perfectly applied in depositing thin films in TFT displays and other related industries. Both of single and multi-piece molybdenum planar targets are available.
Our rotatory titanium sputtering targets have a high utilization rate of more than 75% that ensure you make full use of the target materials.
Indium Bonding and Elastomeric Target Bonding Service are available for Titanium Sputtering Target. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.
|Comments||Alloys with W/Ta/Mo; evolves gas on first heating.|
|Titanium||1.0″ Dia. x 0.125″ Thick|
|Titanium||1.0″ Dia. x 0.250″ Thick|
|Titanium||2.0″ Dia. x 0.125″ Thick|
|Titanium||2.0″ Dia. x 0.250″ Thick|
|Titanium||3.0″ Dia. x 0.125″ Thick|
|Titanium||3.0″ Dia. x 0.250″ Thick|
|Titanium||4.0″ Dia. x 0.125″ Thick|
|Titanium||4.0″ Dia. x 0.250″ Thick|
|Titanium||6.0″ Dia. x 0.125″ Thick|
|Titanium||6.0″ Dia. x 0.250″ Thick|
|Titanium||8.0″ Dia. x 0.125″ Thick|
|Titanium||8.0″ Dia. x 0.250″ Thick|
We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.
Titanium is a chemical element originated from Titans, the sons of the Earth goddess of Greek mythology. It was first mentioned in 1791 and observed by W. Gregor. The isolation was later accomplished and announced by J. Berzelius. “Ti” is the canonical chemical symbol of titanium. Its atomic number in the periodic table of elements is 22 with location at Period 4 and Group 4, belonging to the d-block. The relative atomic mass of titanium is 47.867(1) Dalton, the number in the brackets indicating the uncertainty.
Related Post: An Overview of Titanium Sputtering Target
Sputtering is a process whereby atoms are ejected from a solid target material due to the bombardment of the target by energetic particles. The extreme miniaturization of components in the semiconductor and electronics industry requires high purity sputtering targets for thin film deposition. Titanium sputtering target is used for CD-ROM, decoration, flat panel displays, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Our titanium sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.
We specialize in producing high purity titanium targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.
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Five stars. Shipping was fairly quick. Product was exactly as expected.