(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0523 Platinum Silicide Sputtering Target, PtSiH3

Chemical Formula: PtSiH3
Catalog Number: ST0523
CAS Number: 12137-83-6
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

SAM’s Platinum Silicide Sputter Targets are available in various forms, purities, sizes, and prices. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.


Platinum Silicide Sputtering Target Description


Platinum Silicide (PtSi) Sputtering Targets are crucial materials for thin film deposition in various applications, including semiconductor, optical, and photovoltaic industries. Stanford Advanced Materials (SAM) proudly presents high-quality Platinum Silicide Sputtering Targets designed to meet your specific requirements and achieve precise thin-film coatings.

Related Product: Platinum Sputtering Target.

Platinum Silicide Sputtering Target Specifications

Material Platinum Silicide (PtSi)
Purity 99.9% and above
Shape Discs, Plates, or Custom Shapes
Size Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″
Sputtering Target Bonding Options Indium, Elastomer, or Customized
Surface Roughness As machined or as required
Melting Point Approximately 1,890°C
Available Documents Certificate of Analysis (COA), MSDS, and Customized Documents
Applications Semiconductor, Optical, Photovoltaic, Thin Film Coatings, and more
Packaging Vacuum-sealed in plastic bags, protected by foam, and preserved in a wooden crate

We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.

Platinum Silicide Sputtering Target Applications

Our Platinum Silicide Sputtering Targets are suitable for a wide range of applications, including:

  • Semiconductor Device Fabrication: PtSi targets are used in the manufacturing of semiconductor devices, ensuring precise and reliable thin film coatings.
  • Optical Coatings: PtSi targets are utilized to create optical coatings for lenses, mirrors, and various optical components.
  • Photovoltaic Device Production: PtSi sputtering targets play a vital role in producing photovoltaic devices, contributing to the renewable energy sector.
  • Thin Film Deposition: PtSi is employed for thin film deposition in scientific research, enabling innovative advancements.


Our Platinum Silicide Sputtering Targets are tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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Platinum Silicide Sputtering Target, PtSiH3
Average rating:  
 1 reviews
by John Banks on Platinum Silicide Sputtering Target, PtSiH3

Happy all around. Exactly as described - decent price and fast shipping