(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0524 Tantalum Silicide Sputtering Target, Ta5Si3

Chemical Formula: Ta5Si3
Catalog Number: ST0524
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

SAM’s Tantalum Silicide Sputter Targets are available in various forms, purities, sizes, and prices. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.


Tantalum Silicide Sputtering Target Description

Tantalum Silicide (TaSi2) Sputtering Targets are critical components in thin film deposition processes, widely used in semiconductor, optical, and electronics industries. Stanford Advanced Materials (SAM) offers high-quality Tantalum Silicide Sputtering Targets designed to meet the exacting demands of your applications, enabling precise thin-film coatings with exceptional performance.

Related Product: Tantalum Sputtering Target.

Tantalum Silicide Sputtering Target Specifications

Material Tantalum Silicide (TaSi2)
Purity 99.9% and above
Shape Discs, Plates, Custom Shapes, or as per your specifications
Size Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″
Sputtering Target Bonding Options Indium, Elastomer, or Customized
Surface Roughness As machined or as required
Melting Point Approximately 2,780°C
Available Documents Certificate of Analysis (COA), Material Safety Data Sheet (MSDS), and Customized Documents

We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.

Tantalum Silicide Sputtering Target Applications

Our Tantalum Silicide Sputtering Targets are ideal for a wide range of applications, including:

  • Semiconductor Fabrication: Used in the production of semiconductor devices to create precise thin film coatings.
  • Optical Coatings: Essential for optical components, lenses, and mirrors in the optics industry.
  • Electronics: Key for electronic circuitry and microelectronics.
  • Scientific Research: Utilized for thin film deposition in research and development.


Our Tantalum Silicide Sputtering Targets are tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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Tantalum Silicide Sputtering Target, Ta5Si3
Average rating:  
 1 reviews
by Tim Porter on Tantalum Silicide Sputtering Target, Ta5Si3

Use these regularly in the lab. They work well and never had a defective piece. Great price, shipping is fast.