Chemical Formula: Zr
Catalog Number: ST0059
CAS Number: 7440-67-7
Purity: 99%, 99.9%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Zirconium sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is a trusted sputtering target supplier working with international partners to bring you the highest quality products with the most affordable pricing.
Zirconium Sputtering Target Safety Data Sheet
Zirconium sputtering targets are made from high-purity zirconium metal, known for excellent corrosion resistance, high melting point, and good thermal conductivity. They are widely used in thin film deposition for semiconductor, optical, and protective coating applications.
Key Features:
| Material Type | Zirconium |
| Symbol | Zr |
| Melting Point | 1,852 °C |
| Color/Appearance | Silvery White, Metallic |
| Theoretical Density | 6.49 g/cc |
| Sputter | DC |
| Type of Bond | Copper, Indium, Elastomer |
| Comments | Alloys with W. Films oxidize readily. |
| Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ |
We also offer other customized shapes and sizes of the sputtering targets. Please send us an inquiry for more information.
Thin Film Deposition:
Used in semiconductors, LEDs, solar cells, and display devices for high-quality, stable coatings.
Decorative and Functional Coatings:
Enhances appearance and durability on metals and glass, including automotive and architectural glass.
Corrosion-Resistant Coatings:
Ideal for harsh chemical environments due to zirconium’s excellent corrosion resistance.
Nuclear Industry:
Employed as a fuel rod cladding material because of its low neutron absorption and high corrosion resistance.
Medical and Superconducting Applications:
Used in surgical instruments and superconducting magnets due to biocompatibility and special alloy properties.
Zirconium sputtering materials are commonly available with indium bonding and elastomer bonding options. Copper bonding is also widely used and can be customized based on customer requirements. Stanford Advanced Materials specializes in machining standard backing plates and collaborates with Taiwan Bonding Company to provide comprehensive bonding services. For inquiries about target bonding materials, methods, and services, please click here.
Our Zr sputtering targets are tagged and labeled externally for efficient identification and quality control. They are vacuum-packed to prevent moisture absorption and carefully cushioned to avoid damage during storage and transportation.
SAM’s high-purity Zr sputtering targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film deposition materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.
Q1: What advantages do cylindrical (rotary) zirconium sputtering targets offer over planar targets?
Cylindrical zirconium targets provide larger erosion zones, resulting in 2 to 2.5 times higher material utilization and longer target life, which reduces downtime and maintenance costs in large-area coating processes.
Q2: How does grain size affect the performance of zirconium sputtering targets?
Smaller and uniform grain sizes improve film uniformity and sputtering stability, ensuring consistent coating quality throughout the target’s lifespan.
Q3: Can zirconium sputtering targets be custom-manufactured?
Yes, zirconium targets can be custom-made in various shapes (monolithic, segmented, rotary, planar) and sizes, with precision-machined end features to fit specific cathode systems and optimize coating efficiency.
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Bought these and donated them to the local Community College chemistry lab.
Hope they be happy when they are to receive these gift.
