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Blogs

Stanford Advanced Materials (SAM) Corporation is a global supplier of various sputtering targets such as metals, alloys, oxides, ceramic materials. We update every week about news and knowledge of sputtering targets and evaporation materials. Here are the blogs we published previously.

Semiconductor_Chip

Zirconium Sputtering Targets in Semiconductor Chip Manufacturing

Introduction The semiconductor industry is driving the technological revolution, fueling the progress of electronics, computing, and communications. As performance demands rise and chip dimensions continue to be reduced, the material employed for their manufacture must conform to increasingly stringent specifications. High-purity zirconium sputtering targets have become a flagship material for the industry, making it possible to form high-quality metal oxide thin films, gate material, as well as metal interconnect layers. This article...
indium-tin-oxide-glass-09

Case Study: Improving ITO Target Performance in Mobile and Tablet Display Manufacturing

Introduction One of SAM’s long-term clients—a major display panel manufacturer—was experiencing frequent production disruptions. The culprit: cracking and uneven wear in their ITO sputtering targets, used in the thin-film deposition process for smartphone and tablet displays. After reviewing the setup, SAM proposed switching to denser, more uniform ITO targets. That small change led to significant...
Integrated Circuits

Chromium Sputter Targets’ Value in Semiconductor Manufacturing

Introduction The semiconductor industry is the backbone of modern-day technology, powering everything from smartphones to artificially intelligent computers. As device sizes shrink and performance requirements expand, materials used in the semiconductor production process must be subjected to more demanding needs. High-purity Cr sputtering targets are now the focal material of this technology, enabling high-toughness thin...
high-purity-vanadium-sputtering-targets-in-semiconductor-applications

High-Purity Vanadium Sputtering Targets in Semiconductor Applications

In the semiconductor industry, the demand for smaller, faster, and lower power devices has created a growing demand for advanced materials. High-purity vanadium (V) sputtering targets have also been found to be an essential material in overcoming some of the key challenges in chip manufacturing. With distinguishing features such as excellent conductivity, heat resistance, and...
semiconductor-manufacturing

Tantalum Sputtering Targets in Semiconductor Manufacturing

The insatiable requirement for thinner, faster, and power-saving technologies has made the semiconductor industry one of the prime drivers of technological advancement. Behind the drive is a critical material: high-purity tantalum (Ta) sputtering targets. The targets are a critical ingredient in enabling next-generation semiconductor manufacturing processes, solving dire issues to chip reliability and performance. Tantalum...
Molybdenum Target Shapes

Molybdenum Targets: Classification by Shapes and Applications

In thin film technology, materials need more than just potential—they need consistency, resilience, and performance under pressure. That’s where molybdenum shines. Molybdenum sputtering targets, whether derived from pure metal or alloys, inherit the best of their base: high strength, excellent corrosion resistance, and superior thermal and electrical conductivity. These qualities make molybdenum a trusted material...

Choosing Powder Metallurgy for High-Performance Sputtering Targets

1. Introduction Sputtering targets play a central role in physical vapor deposition (PVD) processes, forming the thin functional layers found in semiconductors, optical components, solar panels, and wear-resistant coatings. As industries continue to push for better film quality, consistency, and performance, the demand for advanced sputtering targets grows accordingly. In particular, refractory metals such as...
Inner linings for components in acid processing

Tantalum and Niobium Targets for High-Temperature Corrosion-Resistant Films

1. Introduction Refractory metals like tantalum (Ta) and niobium (Nb) play an increasingly important role in thin film technology, particularly for environments that demand both high-temperature stability and corrosion resistance. These two elements, known for their exceptionally high melting points and strong chemical inertness, have found widespread use in advanced protective coatings. As industries such...

Graphite Crucibles Used for Metal Smelting

Introduction Crucibles are widely used in metallurgy, chemical processing, and a variety of industries. Among these crucibles, graphite crucibles are useful for the smelting of non-ferrous metals and alloys with their desirable properties. Let’s have a detailed discussion about the features, competitiveness, and uses of graphite crucibles. Hope that you can have a better understanding...
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