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Sputtering Targets
June 4, 2025

Choosing Powder Metallurgy for High-Performance Sputtering Targets

1. Introduction Sputtering targets play a central role in physical vapor deposition (PVD) processes, forming...
Inner linings for components in acid processing
May 28, 2025, ,

Tantalum and Niobium Targets for High-Temperature Corrosion-Resistant Films

1. Introduction Refractory metals like tantalum (Ta) and niobium (Nb) play an increasingly important role...
Tantalum Capacitors
April 25, 2025

The Key Role of Tantalum Targets in Semiconductor Manufacturing

When we think about semiconductor manufacturing, we often picture highly advanced technologies, intricate processes, and...
Ti alloy targets
April 16, 2025

Metal, Ceramic, or Alloy: Choosing the Right Sputtering Target

When it comes to thin film deposition, the choice of sputtering target material can make...
April 11, 2025

Rotary Metal Targets in Semiconductor Sputtering

Ever wondered what makes semiconductor devices work like magic? Well, the answer lies in the...
3 Factors Affecting the Deposition Rate in Magnetron Sputtering
April 2, 2025,

3 Factors Affecting the Deposition Rate in Magnetron Sputtering

Magnetron sputtering is a physical vapor deposition method that allows the deposition of various materials,...
high-entropy-alloy
March 20, 2025,

Advancements in High-Entropy Alloy Targets for Enhanced Material Coatings

I. Introduction High-entropy alloys (HEAs) represent a paradigm shift in alloy design. Unlike traditional alloys...
An Overview of Gold Sputtering Target
February 20, 2025,

An Overview of Gold Sputtering Target

Since ancient times, gold has been revered as a highly valuable material. From making jewelry...
October 18, 2024, ,

What Are Balanced and Unbalanced Magnetron Sputtering?

1. Introduction Sputtering is a key technology for thin-film deposition. It was first introduced in...
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