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Sputtering Targets
Tantalum Capacitors

The Key Role of Tantalum Targets in Semiconductor Manufacturing

When we think about semiconductor manufacturing, we often picture highly advanced technologies, intricate processes, and...
Ti alloy targets

Metal, Ceramic, or Alloy: Choosing the Right Sputtering Target

When it comes to thin film deposition, the choice of sputtering target material can make...

Rotary Metal Targets in Semiconductor Sputtering

Ever wondered what makes semiconductor devices work like magic? Well, the answer lies in the...
3 Factors Affecting the Deposition Rate in Magnetron Sputtering

3 Factors Affecting the Deposition Rate in Magnetron Sputtering

Magnetron sputtering is a physical vapor deposition method that allows the deposition of various materials,...
high-entropy-alloy

Advancements in High-Entropy Alloy Targets for Enhanced Material Coatings

I. Introduction High-entropy alloys (HEAs) represent a paradigm shift in alloy design. Unlike traditional alloys...
An Overview of Gold Sputtering Target

An Overview of Gold Sputtering Target

Since ancient times, gold has been revered as a highly valuable material. From making jewelry...

What Are Balanced and Unbalanced Magnetron Sputtering?

1. Introduction Sputtering is a key technology for thin-film deposition. It was first introduced in...

Top 10 Sputtering Target Materials that Can Withstand High Temperatures

Sputtering is a widely used process in various industries, from electronics to optics. High-temperature sputtering...

Iridium Sputtering Target in Semiconductor Manufacturing

In the rapidly evolving semiconductor industry, the choice of materials for thin film deposition plays...
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