Chemical Formula: BiFeO3
Catalog Number: ST0136
CAS Number: 12010-42-3
Purity: 99.9%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Stanford Advanced Materials (SAM) is experienced in providing the best bismuth ferrite sputtering target on the market. We also customize various shapes according to your requirements or drawings.
Bismuth ferrite sputtering target from Stanford Advanced Materials is an oxide sputtering material with the formula BiFeO3.
Related Product: Bismuth (Bi) Sputtering Target
Related Product: Iron (Fe) Sputtering Target
Related Product: Oxide Ceramic Sputtering Target
The bismuth ferrite sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Our bismuth ferrite sputter targets are tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
High-quality bismuth ferrite sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes. Please send us an inquiry for the current prices of the sputtering targets and other deposition materials that are not listed.
Submit your review | |
1 2 3 4 5 | |
Submit Cancel |
good quality target of near pure bismuth ferrite, perfect for film coating