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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0136 Bismuth Ferrite Sputtering Target, BiFeO3

Chemical Formula: BiFeO3
Catalog Number: ST0136
CAS Number: 12010-42-3
Purity: 99.9%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

 Stanford Advanced Materials (SAM) is experienced in providing the best bismuth ferrite sputtering target on the market. We also customize various shapes according to your requirements or drawings.




Description

Bismuth Ferrite Sputtering Target Description

Bismuth ferrite sputtering target from Stanford Advanced Materials is an oxide sputtering material with the formula BiFeO3.

BismuthBismuth is a chemical element that originated from the German ‘Bisemutum’ a corruption of ‘Weisse Masse’ meaning white mass. It was early used in 1753 and discovered by C.F. Geoffroy. “Bi” is the canonical chemical symbol of bismuth. Its atomic number in the periodic table of elements is 83 with location at Period 6 and Group 15, belonging to the p-block. The relative atomic mass of bismuth is 208.98040(1) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Bismuth (Bi) Sputtering Target

ironIron, also called ferrum, is a chemical element that originated from the Anglo-Saxon name iren (ferrum in Latin). It was early used before 5000 BC. “Fe” is the canonical chemical symbol of iron. Its atomic number in the periodic table of elements is 26 with a location at Period 4 and Group 8, belonging to the d-block. The relative atomic mass of iron is 55.845(2) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Iron (Fe) Sputtering Target

OxygenOxygen is a chemical element that originated from the Greek ‘oxy’ and ‘genes’ meaning acid-forming. It was first mentioned in 1771 and observed by W. Scheele. The isolation was later accomplished and announced by W. Scheele. “O” is the canonical chemical symbol of oxygen. Its atomic number in the periodic table of elements is 8 with a location at Period 2 and Group 16, belonging to the p-block. The relative atomic mass of oxygen is 15.9994(3) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Oxide Ceramic Sputtering Target

Bismuth Ferrite Sputtering Target Application

The bismuth ferrite sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Bismuth Ferrite Sputtering Target Packing

Our bismuth ferrite sputter targets are tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Get Contact

High-quality bismuth ferrite sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes. Please send us an inquiry for the current prices of the sputtering targets and other deposition materials that are not listed.

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Bismuth Ferrite Sputtering Target, BiFeO3
Average rating:  
 1 reviews
by David M on Bismuth Ferrite Sputtering Target, BiFeO3

good quality target of near pure bismuth ferrite, perfect for film coating