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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0023 Iron (Fe) Sputtering Target

Chemical Formula: Fe
Catalog Number: ST0023
CAS Number: 7439-89-6
Purity: 99.9%, 99.95%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made


Description of Iron Sputtering Target

ironIron, also called ferrum, is a chemical element originated from the Anglo-Saxon name iren (ferrum in Latin). It was early used before 5000 BC. “Fe” is the canonical chemical symbol of iron. Its atomic number in the periodic table of elements is 26 with location at Period 4 and Group 8, belonging to the d-block. The relative atomic mass of iron is 55.845(2) Dalton, the number in the brackets indicating the uncertainty.

Iron also has biological importance as it is responsible for carrying oxygen in blood. It is evaporated under vacuum to form layers in the production of semiconductors, magnetic storage media, and fuel cells, just to name a few.

Specification of Iron Sputtering Target

Material Type Iron
Symbol Fe
Color/Appearance Solid
Melting Point 1,535 °C
Sputter DC
Density 7.86 g/cc
Thermal Conductivity 80 W/m.K
Coefficient of Thermal Expansion 11.8 x 10-6/K
Comments Attacks W. Films hard, smooth. Preheat gently to outgas.
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.

Application of Iron Sputtering Target

The iron sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.


Our Iron sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Get Contact

SAM’s iron sputtering targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film deposition materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.

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Iron (Fe) Sputtering Target
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by Alex Mills on Iron (Fe) Sputtering Target

Used these for classroom chemical projects and experiments. Works great.