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ST0137 Bismuth Iron Oxide Sputtering Target, Bi3Fe5O12

Chemical Formula: Bi3Fe5O12
Catalog Number: ST0137
CAS Number: 12048-65-6
Purity: 99.9%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Stanford Advanced Materials (SAM) is experienced in providing the best bismuth iron oxide sputtering target on the market. We also customize various shapes according to your requirements or drawings.




Description

Bismuth Iron Oxide Sputtering Target Description

Bismuth iron oxide sputtering target from Stanford Advanced Materials is an oxide sputtering material with the formula Bi3Fe5O12.

BismuthBismuth is a chemical element that originated from the German ‘Bisemutum’ a corruption of ‘Weisse Masse’ meaning white mass. It was early used in 1753 and discovered by C.F. Geoffroy. “Bi” is the canonical chemical symbol of bismuth. Its atomic number in the periodic table of elements is 83 with location at Period 6 and Group 15, belonging to the p-block. The relative atomic mass of bismuth is 208.98040(1) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Bismuth (Bi) Sputtering Target

ironIron, also called ferrum, is a chemical element that originated from the Anglo-Saxon name iren (ferrum in Latin). It was early used before 5000 BC. “Fe” is the canonical chemical symbol of iron. Its atomic number in the periodic table of elements is 26 with a location at Period 4 and Group 8, belonging to the d-block. The relative atomic mass of iron is 55.845(2) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Iron (Fe) Sputtering Target

OxygenOxygen is a chemical element that originated from the Greek ‘oxy’ and ‘genes’ meaning acid-forming. It was first mentioned in 1771 and observed by W. Scheele. The isolation was later accomplished and announced by W. Scheele. “O” is the canonical chemical symbol of oxygen. Its atomic number in the periodic table of elements is 8 with a location at Period 2 and Group 16, belonging to the p-block. The relative atomic mass of oxygen is 15.9994(3) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Oxide Ceramic Sputtering Target

Bismuth Iron Oxide Sputtering Target Application

The bismuth iron oxide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Bismuth Iron Oxide Sputtering Target Packing

Our bismuth iron oxide sputter targets are tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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High-quality bismuth iron oxide sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes. Please send us an inquiry for the current prices of the sputtering targets and other deposition materials that are not listed.

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Bismuth Iron Oxide Sputtering Target, Bi3Fe5O12
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