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(949) 407-8904 Mon - Fri 09:00 - 18:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 09:00 - 18:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0156 Iron Oxide (Fe2O3) Sputtering Target

Chemical Formula: Fe2O3
Catalog Number: ST0156
CAS Number: 1309-37-1
Purity: 99.9%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made




Description

Target Bonding of Iron Oxide Sputtering Target

Indium bonding is available for the Iron Oxide sputtering targets. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.

Description of Iron Oxide Sputtering Target

Iron

ironIron, also called ferrum, is a chemical element originated from the Anglo-Saxon name iren (ferrum in Latin). It was early used before 5000 BC. “Fe” is the canonical chemical symbol of iron. Its atomic number in the periodic table of elements is 26 with location at Period 4 and Group 8, belonging to the d-block. The relative atomic mass of iron is 55.845(2) Dalton, the number in the brackets indicating the uncertainty.

 

Packaging of Iron Oxide Sputtering Target

Our Iron Oxide Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

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We specialize in producing high purity Iron Oxide Sputtering Target with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

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Iron Oxide (Fe2O3) Sputtering Target
Average rating:  
 1 reviews
by Eric Garcetti on Iron Oxide (Fe2O3) Sputtering Target

These Fe2O3 targets are really nice. They're made from very good raw materials. They are really well-made.