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sputter target

A useful guide book of the use of sputtering targets

Preparation It is very important to keep the vacuum chamber clean. Some residues formed during...
aluminum thin films 2

Preparation and application of aluminum thin films

Common metal materials (such as low carbon steel, metal uranium, etc.) are very reactive and...
magnetron sputtering

Main Factors Affecting the Voltage of Magnetron Sputtering

Target magnetic field The cathode operating voltage of magnetron sputtering decreases as the target surface...
Ceramics

An overview of Ceramics

Introduction Ceramic is the general term for pottery and porcelain. The components of the ceramic...
thin film solar cell

Preparation of CIGS absorber layer

1. Preparation of Cu/In film by magnetron sputtering In order to accurately control the element...
ITO

Four main molding methods for ITO (Indium Tin Oxide) targets

As is known, the ITO sputtering target is a black-gray ceramic semiconductor formed by a...
Sputtering voltage

Influencing Factors of the Sputtering Deposition Rate of Magnetron Targets

Sputter deposition rate is a parameter that characterizes the film formation rate. In addition to...
PVD camera

What are the uses of PVD (Physical Vapor Deposition) coating?

PVD(Physical Vapor Deposition) coating, a physical terminology which is seemingly difficult to understand, actually is...
common-target-color

Common Targets And Corresponding Color

Common targets and corresponding color 1. Golden Color Series Ti series: Ti       TiN Ti+Au    TiN+Au...
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