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magnetron sputtering
August 9, 2018

Main Factors Affecting the Voltage of Magnetron Sputtering

Target magnetic field The cathode operating voltage of magnetron sputtering decreases as the target surface...
Ceramics
August 8, 2018

An overview of Ceramics

Introduction Ceramic is the general term for pottery and porcelain. The components of the ceramic...
thin film solar cell
August 6, 2018,

Preparation of CIGS absorber layer

1. Preparation of Cu/In film by magnetron sputtering In order to accurately control the element...
ITO
July 30, 2018

Four main molding methods for ITO (Indium Tin Oxide) targets

As is known, the ITO sputtering target is a black-gray ceramic semiconductor formed by a...
Sputtering voltage
July 26, 2018

Influencing Factors of the Sputtering Deposition Rate of Magnetron Targets

Sputter deposition rate is a parameter that characterizes the film formation rate. In addition to...
PVD camera
July 24, 2018

What are the uses of PVD (Physical Vapor Deposition) coating?

PVD(Physical Vapor Deposition) coating, a physical terminology which is seemingly difficult to understand, actually is...
common-target-color
July 18, 2018

Common Targets And Corresponding Color

Common targets and corresponding color 1. Golden Color Series Ti series: Ti       TiN Ti+Au    TiN+Au...
4 Applications of High-purity Titanium Target Materials
July 12, 2018,

4 Applications of High-purity Titanium Target Materials

As is known to all, purity is one of the main performance indexes of sputtering...
Thin Film Solar Cell
July 11, 2018,

Merits and Demerits of Different Thin Film Solar Cell Target Materials

It is well known that different types and characteristics of transparent solar electrodes can be...
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