Chemical Formula: Si/Cr
Catalog Number: ST0508
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
SAM’s Silicon Chromium Sputter Targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
Unlock the potential of Silicon Chromium Sputtering Targets and explore their diverse applications across various industries. This page provides insights into the key characteristics and applications of integrating Silicon Chromium into thin film deposition processes.
Silicon, derived from the Latin ‘silex’ or ‘silicis’ meaning flint, is a vital chemical element. Isolated and announced by J. Berzelius, silicon holds the chemical symbol “Si” with an atomic number of 14. Its atomic mass is 28.0855(3) Dalton, denoting the uncertainty.
Chromium, a silvery-white, soft, non-magnetic, and ductile metal, resides within the boron group. It exists in over 270 minerals and contributes to reflective coatings on telescopes, automotive components, and more. The aerospace, automotive lighting, OLED, and optical industries extensively employ it.
|Material Type||Silicon Chromium|
|Color/Appearance||Metallic solid in various forms including powder, sputtering target, foil, bar, plate|
|Available Sizes||Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ <br> Thick: 0.125″, 0.250″ <br> Custom shapes and sizes available on inquiry.|
|Packing||Targets are tagged and labeled externally for identification and quality control. Careful handling during storage and transportation.|
Leverage the potential of Silicon Chromium Sputtering Targets and harness their exceptional properties for innovative applications across industries. Contact us today for inquiries and customized solutions.
Submit your review
Good value, fast shipping, tight package. As described.