(949) 407-8904 Mon - Fri 08:00 - 17:00 1940 East Deere Avenue, Suite 100, Santa Ana, CA 92705, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 1940 East Deere Avenue, Suite 100, Santa Ana, CA 92705, USA

ST0009 Chromium Sputtering Target, Cr Target

Chemical Formula: Cr
Catalog Number: ST0009
CAS Number: 7440-47-3
Purity: 99.9%, 99.95%, 99.99%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Chromium sputtering targets are available in various forms, purities, sizes, and prices. Other customized chromium sputter target products are also available upon your requirements.

Chromium Sputtering Target Safety Data Sheet

 




Description

High-Purity Chromium for Advanced Thin Film Applications

Chromium Sputtering Target Description

Chromium

Chromium sputtering targets are fabricated using high-purity chromium metal, a hard, lustrous, and brittle transition metal whose high corrosion resistance and hardness are the cause of its many uses. About 70% of visible light and almost 90% of infrared light are reflected by polished chromium, so it is very resistant to tarnish. Chromium targets are the best targets for making thin films that are durable, reflective, and wear-resistant due to these characteristics.

Chromium targets for sputtering have applications in aerospace, automotive lighting, OLED displays, optical thin films, and stainless steel production. Chromium alloys like Cu-Cr-Zr also exhibit high electrical conductivity, strength, and heat resistance, broadening the use to semiconductor devices, electronic packaging, and functional coatings.

Key Features:

  • High purity (typically ≥99.9%) for optimum film quality
  • Good corrosion and oxidation resistance
  • High hardness and wear resistance for protective coatings
  • Enhanced reflectivity in visible and infrared regions
  • Sold in the form of pure metal and alloy (e.g., Cu-Cr-Zr)
  • Supplying varied bonding structures and shapes to provide increased sputtering efficiency
  • Physical characteristics that are stable with high melting point (~1907°C) and high thermal conductivity

Chromium Sputtering Target Specification

Material Type Chromium
Symbol Cr
Automatic Number 24
Color/Appearance Silvery, Metallic, Solid State
Melting Point 1,857°C
Theoretical Density 7.2 g/cc
Sputter DC
Type of Bond Indium, Elastomer
Comments Films very adherent. High rates possible.
Target Dimensions & Thickness Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

We also offer other customized shapes and sizes of the sputtering targets. Please send us an inquiry for more information.

Chromium Sputtering Target Application

Chromium sputter target is used in many vacuum applications:

  • Thin Film Coatings:
    Used as corrosion-resistance and wear-resistance coatings for electronic and optical equipment.

  • Automotive Decorative and Protective Coatings:
    Provides hard, resistant, and corrosion-resistant decorative films for automobile parts.

  • Semiconductor Fabrication:
    Serves as adhesion and conductive layers to ensure device performance and stability.

  • Industrial Hard Coatings:
    Applied on cutting tools and machinery components to extend service life.

Chromium Sputtering Target Bonding

Chromium Cr Sputtering Targets are commonly available with indium bonding and elastomer bonding options. Copper bonding is also widely used and can be customized based on customer requirements. Stanford Advanced Materials specializes in machining standard backing plates and collaborates with Taiwan Bonding Company to provide comprehensive bonding services. For inquiries about target bonding materials, methods, and services, please click here.

Target Bonding Services

Chromium Sputtering Target Packaging

Our chromium sputtering targets are tagged and labeled externally for efficient identification and quality control. They are vacuum-packed to prevent moisture absorption and carefully cushioned to avoid damage during storage and transportation.

Get Contact

SAM’s chromium sputtering targets are of ultra-high purity. They are available in various forms, purities, sizes, and prices. We specialize in producing high-purity thin film coating materials with the highest available density and smallest average grain size for semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical markets. Please ask us for current pricing on sputtering targets and other deposition materials not listed.

FAQs of Chromium Sputtering Target

Q1: What are the levels of purity your chromium sputtering targets offer, and how does purity affect film quality?
We generally offer chromium sputtering targets with purities 99.9% and above. Increased purity reduces contamination and defects in films deposited, leading to better corrosion resistance, hardness, and optical properties critical to high-performance applications.

Q2: Can chromium sputtering targets be customized in size, shape, or bonding method to fit specific equipment?
Yes, we provide custom sizes, shapes, and bonding options (such as copper bonding) to ensure optimal fit and thermal management in your sputtering system, improving target lifespan and coating uniformity.

Q3: What assurance do you have regarding the stability and reliable operation of chromium sputtering targets?
Advanced manufacturing techniques and welding are employed to minimize cracking and improve bonding strength between the target and the backing plate. Fine grain structure and high density are ensured by high quality control, resulting in increased target life and reproducible sputtering performance.

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Chromium (Cr) Sputtering Target
Average rating:  
 1 reviews
by Jose Guzman on Chromium (Cr) Sputtering Target

These work great. I've only used them to sputter a thin film. They are a great price too.