(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0498 Iridium Manganese Sputtering Target, Ir/Mn

Chemical Formula: Ir/Mn
Catalog Number: ST0498
CAS Number: 12142-03-9
Purity: 99%~99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

At SAM, we provide a range of Iridium Manganese Sputter Targets in different forms, purities, sizes, and prices. Our expertise lies in producing high-purity physical vapor deposition materials, optimized for use in semiconductor, chemical vapor deposition, and physical vapor deposition applications in displays and optics. If you require further information or have specific inquiries, feel free to contact us.


Iridium Manganese Sputtering Target Description

IridiumIridium is a rare, hard, lustrous, brittle, very dense platinum-like metal. Chemically it is almost as unreactive as gold. It is the most corrosion-resistant metal known and it resists attack by any acid. Iridium is generally credited with being the second densest element (after osmium) based on measured density, although calculations involving the space lattices of the elements show that iridium is denser.

manganeseManganese is a chemical element originated from Either the Latin ‘magnes’, meaning magnet or from the black magnesium oxide, ‘magnesia nigra’. It was first mentioned in 1770 and observed by O. Bergman. The isolation was later accomplished and announced by G. Gahn. “Mn” is the canonical chemical symbol of manganese. Its atomic number in the periodic table of elements is 25 with location at Period 4 and Group 7, belonging to the d-block. The relative atomic mass of manganese is 54.938045(5) Dalton, the number in the brackets indicating the uncertainty.

Related Products: Iridium Sputtering TargetManganese Sputtering Target.

Iridium Manganese Sputtering Target Specifications

Material Type Iridium Manganese
Symbol Ir/Mn
Color/Appearance Gray metallic solid in various forms
Melting Point 117 °C
Density /
Available Sizes Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.

Iridium Manganese Sputtering Target Application

Iridium Manganese Sputtering Target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Iridium Manganese Sputtering Target Packing

Our Iridium Manganese Sputtering Targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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SAM’s Iridium Manganese Sputter Targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.

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Iridium Manganese Sputtering Target, Ir/Mn
Average rating:  
 1 reviews
by Jerry F. on Iridium Manganese Sputtering Target, Ir/Mn

Super useful. The package is tight and the shipping is fast.